Study on analytical method for zirconium and hafnium im refractory alloy by ICP OES

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外文摘要：In this paper authors established a new method that can analyze Zr， Hf in the same time。 First the tantalum-niobium was pretreated by chromatography method on paper， then Zr and Hf were determined by ICP-OES。 Operating parameters of ICP-OES (Plasma 2000): RF Power Forward: 1100W; Reflected M5W Agon gas flow: Coolant 13L/min; Auxiliary: 1。00L/min; Nebulizer: 0。700L/min; Viewing height: 2mm。 The determine range of zirconium and hafnium is 0。0x

外文关键词：

hafniumzirconiumICP-OESchromatography

作者：

Wu Xinyou、Tong Jian

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会议名称：

International conference on engineering and technological sciences;ICETS2000

会议地点：

Beijing(CN);Beijing(CN)

会议母体文献：

Proceedings of International Conference on Engineering and Technological Sciences 2000 Session 3: International Symposium on Advanced Materials, October 11, 2000, Beijing, China, Volume 2

页码：

p.1400-1402

出版时间：

2000