首页|Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating
Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method。The results show that the deposition rate does not change with the increasing deposition time。The increase of mass flow rate of N2 gives rise to the increase of deposition rate。All as-deposited TiO2 and N-doped TiO2 films are amorphous。The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 ℃ for 2 h。The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region。
arc ion platingphotocatalytic TiO2N-doped TiO2absorption edge
WEI Long、ZHANG Chanjuan
展开 >
LI Ming-sheng@Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanchang 330013,China--ZHANG Shu-juan@Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanchang 330013,China--LOU Jin@Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanchang 330013,China--LIU Ting-zhi@Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanchang 3300
ICNFM 2007;International Workshop on Nonferrous Materials
Changsha and Zhangjiajie(CN)
Transactions of Nonferrous Metals Society of China pt.I
NETL
