Optical interferometry Endpoint Detection for Plasma Etching

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外文摘要：The optical interferometry is a non-invasive plasma diagnostic method。Etch experiment were carried out in a high density plasma etching tool (ICP)。The theoretic model for optical interferometric endpoint detection and prediction in plasma etching are presented。It is observed that the optical properties of oxide layer and polysilicon layer can affect the interferometric signals。The endpoint algorithm and real time plasma parameters diagnostics are discussed，then process control with optical interferometry during the poly-silicon etch is described。The endpoint prediction technique has been applied to poly-silicon gate etching in high density plasma etching tools。

外文关键词：

optical interferometryplasma etchingendpoint detectiontheory modelprocess control

作者：

Wang Wei、Lan Zhongwen、Wen Wu、Gong Yungui

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作者单位：

College of Electronics Engineering,Chongqing University of Posts and Telecommunication,Chongqing 400065 China

College of Microelectronics and Solid State Electronics,UESTC,Chengdu,610054 China

Chongqing Chongyou Information Technology Co.LTD,Chongqing,400065 China

会议地点：

西安

出版时间：

2007