首页|電子とイオンの電流密度分布が及ぼす真空アーク陰極点の移動のシミユレーション

電子とイオンの電流密度分布が及ぼす真空アーク陰極点の移動のシミユレーション

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The vacuum arc cathode spot can be applied to pretreatment of thermal spray because the surface of cathode is evaporated by the vacuum arc cathode spot However, the behavior of cathode spot is random manner caused by the current density. Thus, it is necessary to calculate the electron and ion current. In this paper, simulation of vacuum arc cathode spot movement affected by electron and ion current density distribution is elucidated. As a result, the electromagnetic force caused by ion and electron current was calculated. The moving speed of the cathode spot increases with increasing the magnetic flux density. Therefore, it can be expected to improve the surface treatment technology with vacuum arc cathode spot.
電子とイオンの電流密度分布が及ぼす真空アーク陰極点の移動のシミユレーション

真空アーク陰極点電流密度電子電流密度イオン電流密度

山本真司、根本雄介、真栄田義史、岩尾徹

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東京都巿大学

放電研究会;静止器研究会;開閉保護研究会

石川(JP)

電気学会研究会資料 放電 静止器 開閉保護合同研究会

49-54

2018