首页|多重散射对40 nm SRAM和3D-SRAM单粒子翻转的影响

多重散射对40 nm SRAM和3D-SRAM单粒子翻转的影响

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基于RPP(rectangular parallelepiped)模型,利用Geant4软件包,构建了一个40 nm SRAM器件模型用于单粒子翻转效应模拟,通过Weibull函数拟合得到σsat和LETth分别为8.98 × 10-9 cm2·bit-1和0.084 MeV/(mg·cm-2).基于3D-IC技术设计了一种新的3D-SRAM器件,通过Geant4进行了建模和单粒子翻转模拟,结果表明,在同一 3D-SRAM器件中上层单元对下层单元有防护作用.通过改变覆盖层中的高Z材料,发现高Z材料可以有效地减少Fe离子在射程末端的多重散射,且Ta的效果优于W.在同一 3D-SRAM器件中,下层单元(die3)的多重散射截面峰值更低.
The effect of multiple scattering on 40 nm SRAM and 3D-SRAM single event upset
Based on the rectangular parallelepiped model,a 40nm SRAM device model was constructed in Geant4 for its single event upset simulation in this paper.σsat and LETth were 8.98×10-9 cm2·bit-1 and 0.084 MeV/(mg·cm-2),which were obtained through Weibull fitting based on simulation result.A stacked 3D-SRAM device was designed using 3D-IC method and constructed in Geant4,which could be used for SEU simulation.The results showed the protective effect of the upper unit on the lower unit in the same 3D-SRAM.By changing the high Z material in the overlayer,it was found that the high Z material could effectively reduce the multiple scattering at the end of the Fe-ion range,and Ta had a better performance than W.In the same 3D-SRAM,the lower unit(die3)had a smaller multiple scattering cross-section.

Geant4single event upsetmultiple scattering3D-SRAM

罗云龙、李刚、张宇

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安徽大学物质科学与信息技术研究院,安徽 合肥 230601

安徽大学物理与光电工程学院,安徽 合肥 230601

合肥工业大学物理学院,安徽 合肥 230601

Geant4 单粒子翻转 多重散射 3D-SRAM

2025

安徽大学学报(自然科学版)
安徽大学

安徽大学学报(自然科学版)

北大核心
影响因子:0.49
ISSN:1000-2162
年,卷(期):2025.49(1)