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铜结晶器表面双脉冲共沉积制备Co-Ni-Ce防护镀层

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为了提高铜结晶器的防护能力,延长其使用寿命,本文利用双脉冲在氨基磺酸体系下共沉积制备Co-Ni-Ce防护镀层,研究Co(SO3NH2)2·4H2O质量浓度、脉冲电流密度、电信号控制以及CeCl3·7H2O质量浓度等工艺参数对镀层硬度的影响.实验结果表明,最优工艺参数为Co(SO3NH2)2·4H2O质量浓度33.3 g/L,脉冲电流密度4 A/dm2,占空比40%,脉冲频率20 kHz,CeCl3·7H2O质量浓度2 g/L;硬度达到559.01 HV;Co-Ni-Ce镀层形貌致密,晶粒分布均匀.添加Ce以后,合金衍射峰择优取向由(111)向(200)转变,无金属单质相生成.
Preparation of Co-Ni-Ce coatings by double-pulse co-deposition on copper crystallizer surfaces
To enhance the protective capabilities of copper crystallisers and prolong their lifespan,this study focuses on the preparation of Co-Ni-Ce protective coatings through co-deposition using a double pulse tech-nique in a sulfamic acid system.The research investigates the impact of various process parameters,such as the Co(SO3NH2)2·4H2O mass concentration,pulse current density,electrical signal control,and the CeCl3·7H2O mass concentration,on the hardness of the coatings.The findings indicate that the optimal process pa-rameters include a Co(SO3NH2)2·4H2O mass concentration of 33.3 g/L,pulse current density of 4 A/dm2,du-ty cycle of 40%,pulse frequency of 20 kHz,and CeCl3·7H2O mass concentration of 2 g/L.These parameters resulted in a hardness of 559.01 HV,with the Co-Ni-Ce plating layer exhibiting a dense morphology and uni-form grain distribution.Furthermore,the addition of Ce led to a preferential orientation of the diffraction peaks of the alloy from(111)to(200),without the formation of any metallic monolithic phase.

copper crystallizerdouble pulseCo-Ni-Ceco-depositionrare earths

邢洪旋、李继东、金森虎、胡宪伟、王一雍、王露彬

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辽宁科技大学 冶金工程省级重点实验室,辽宁 鞍山 114051

东北大学 冶金学院,辽宁 沈阳 110819

铜结晶器 双脉冲 Co-Ni-Ce 共沉积 稀土

辽宁省冶金工程省级重点实验室开放基金辽宁科技大学研究生教育改革与科技创新创业项目

2023KFKT-10LKDYC202321

2024

辽宁科技大学学报
辽宁科技大学

辽宁科技大学学报

影响因子:0.349
ISSN:1674-1048
年,卷(期):2024.47(2)