超低膨胀合成石英玻璃关键制造工艺研究
Study on Key Manufacturing Process of Ultra-low Thermal Expansion Synthetic Quartz Glass
张寒 1刘俊龙 1耿爱霞 1周轶 1朱梦瑶 1刘志龙1
作者信息
- 1. 湖北菲利华石英玻璃股份有限公司 荆州 434000;特种光学玻璃材料技术创新中心 荆州 434000
- 折叠
摘要
超低膨胀石英玻璃在室温区间下具有近零的热膨胀系数,常作为精密光路系统的反射镜、激光谐振腔体等部件应用于天基太空望远镜、半导体光刻设备用光学元件、原子钟等领域,在航空航天、精密测量等领域具有重要作用.本研究使用四氯化硅和四氯化钛为原料,采用化学气相沉积(CVD)法将二氧化钛均匀掺入石英玻璃基体中实现精确控制掺杂含量,制备出的超低膨胀石英玻璃在室温区间下具有近零的热膨胀系数,零膨点温度区域可控,热膨胀系数(0～35℃)小于0±20×10-9/℃,达到国内先进水平,对制备超低膨胀系数石英玻璃具有积极的意义.
Abstract
Ultra-low thermal expansion quartz glass has a near-zero coefficient of thermal expansion at room temperature and is often used as mirrors for precision optical path systems,laser resonator cavities,and other components in space-based telescopes.It is also utilized in optical components for semiconductor lithography equipment,atomic clocks,and other fields.This material plays an important role in aerospace and precision measurement.Currently,there is still a certain gap between domestic ultra-low expansion quartz glass preparation technology and foreign advanced processing and manufacturing technology.In this study,silicon tetrachloride and titanium tetrachloride were used as raw materials to uniformly dope titanium dioxide into the quartz glass matrix using the chemical vapor deposition(CVD)method to achieve precise control of the doping content.The prepared ultra-low expansion quartz glass exhibits nearly zero thermal expansion coefficient at room temperature with controllable zero expansion point temperature area.The thermal expansion coefficient(0～35 ℃)is less than 0±20 × 10-9/℃ reaching the leading level domestically.This achievement holds positive significance for the preparation of ultra-low expansion coefficient quartz glass.
关键词
超低膨胀石英玻璃/热膨胀系数/化学气相沉积法Key words
ultra-low thermal expansion quartz glass/coefficient of thermal expansion/chemical vapour deposition引用本文复制引用
基金项目
湖北省科学技术厅重点研发计划项目(2021BAA062)
出版年
2024
NETL
NSTL
万方数据