Study on Key Manufacturing Process of Ultra-low Thermal Expansion Synthetic Quartz Glass
Ultra-low thermal expansion quartz glass has a near-zero coefficient of thermal expansion at room temperature and is often used as mirrors for precision optical path systems,laser resonator cavities,and other components in space-based telescopes.It is also utilized in optical components for semiconductor lithography equipment,atomic clocks,and other fields.This material plays an important role in aerospace and precision measurement.Currently,there is still a certain gap between domestic ultra-low expansion quartz glass preparation technology and foreign advanced processing and manufacturing technology.In this study,silicon tetrachloride and titanium tetrachloride were used as raw materials to uniformly dope titanium dioxide into the quartz glass matrix using the chemical vapor deposition(CVD)method to achieve precise control of the doping content.The prepared ultra-low expansion quartz glass exhibits nearly zero thermal expansion coefficient at room temperature with controllable zero expansion point temperature area.The thermal expansion coefficient(0～35 ℃)is less than 0±20 × 10-9/℃ reaching the leading level domestically.This achievement holds positive significance for the preparation of ultra-low expansion coefficient quartz glass.
ultra-low thermal expansion quartz glasscoefficient of thermal expansionchemical vapour deposition
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