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靶材对溅射沉积TiO2涂层微观结构与性能的影响

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分别采用TiO2陶瓷靶和Ti金属靶,通过磁控溅射技术在TC4钛合金表面制备TiO2涂层,并利用扫描电子显微镜、X射线衍射仪、X射线光电子能谱仪、划痕仪和电化学工作站对试样进行测试,研究其微观结构、结合强度、亲水性和耐蚀性。研究结果表明,两种涂层都呈非晶柱状结构,其亲水性能相近,钛元素的存在形式均为TiO2;与金属靶制备的TiO2涂层相比,陶瓷靶制备的TiO2涂层的致密性、结合强度和耐蚀性显著提高。
Effects of Target Material on Microstructure and Properties of TiO2 Coating by Sputtering Deposition
TiO2 coatings were prepared on TC4 titanium alloy substrate via magnetron sputtering technology with TiO2 ceramic and Ti metal targets,respectively.The coatings were characterized using scanning electron microscopy,X-ray diffractometer,X-ray photoelectron spectrometer,scratch tester,and electrochemical workstation.The microstructure,bonding strength,hydrophilicity,and corrosion resistance of the coatings were systematically investigated.The results showed that both coatings had an amorphous columnar structure with comparable hydrophilic properties,and the Ti element existed as TiO2.TiO2 coatings synthesized from ceramic targets demonstrated significantly improved density,bonding strength,and corrosion resistance compared to those prepared from metal targets.

itanium alloytarget materialmagnetron sputteringtitanium oxidecoating

罗侃、李文元、姚泉、李健智、丁泽良

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湖南工业大学包装与材料工程学院 湖南 株洲 412007

钛合金 靶材 磁控溅射 氧化钛 涂层

2024

包装学报
湖南工业大学

包装学报

影响因子:0.509
ISSN:1674-7100
年,卷(期):2024.16(6)