首页|高温退火对硅基微腔的光致发光影响

高温退火对硅基微腔的光致发光影响

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纳米硅的研究是目前发光领域中非常活跃的方向.其发光性能可改进目前的硅基发光器件的性能,实现硅基光源集成,有利于突破其发光效率低的技术瓶颈.通过分别控制空气和氧退火氛围、不同的退火时间,采用纳秒脉冲激光制备蜂窝状纳米单晶硅阵列的腔体结构,分别获得对应纳米硅表面Si-O-Si局域态630 nm光致发光源和对应Si=O的局域态710 nm光致发光源.为了进一步解释这种现象,提出一种局域态与量子限制效应相互竞争导致硅材质表面形成类三能级结构的模型,该类三能级结构可在控制不同退火氛围和不同退火时间的机制下,受到光激励而形成可调制特征发光源.
Effect of High Temperature Annealing on Photoluminescence of Silicon Based Microcavity
The research on nano-silicon is currently a very active direction in the field of luminescence. Its luminescent properties can improve the performance of silicon-based light-emitting devices,achieve integrated silicon-based lighting sources,and break through the technical bottleneck of low light efficiency in future. This paper uses nanosecond pulsed lasers to prepare a cavity structure of honeycomb-shaped monocrystalline silicon arrays by controlling different annealing atmo-spheres (air and oxygen) and annealing times,obtaining corresponding Si-O-Si local states at 630 nm and Si=O local states at 710 nm photoluminescence sources,respectively. To further explain this phenomenon,a model is proposed that localized states compete with quantum confinement effects that induces the formation of a quasi-three-level structure on the surface of silicon materials. This quasi-three-level structure can be stimulated by light under controlled annealing atmo-spheres and annealing times to form a modulated characteristic light-emitting source.

photoluminescencelocalized statesnano silicon

周晓雨、彭鸿雁、邵铭、程相正、谭勇

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海南师范大学 物理与电子工程学院,海口 571158

光电对抗测试评估技术重点实验室,洛阳 471003

长春理工大学 物理学院,长春 130022

光致发光 局域态 纳米硅

吉林省自然科学基金

YDZJ202201ZYTS510

2024

长春理工大学学报(自然科学版)
长春理工大学

长春理工大学学报(自然科学版)

CSTPCD
影响因子:0.432
ISSN:1672-9870
年,卷(期):2024.47(3)
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