Fabrication And Characterization of Thin Film Strain Gauge for Strain Measurement Under Special Environment
RF sputtering is used to create Karma alloy thin film strain gauges on alumina substrates.Karma alloy thin films'changes in e-lectrical characteristics and strain properties at various annealing temperatures are evaluated,and it is determined how annealing tempera-ture affects the surface morphology and crystal structure of Karma alloy thin films.The results demonstrate that as the annealing tempera-ture increases,the resistivity of the Karma alloy thin films gradually decreases,and its temperature coefficient of resistance gradually in-creases.Karma thin film strain gages are discovered to have the lowest TCR of 59.9×10-6/℃under room temperature.After 200℃an-nealing process,the Karma alloy thin films achieve the gage factor of 2.2,and the TCR of 64.4×10-6/℃.The piezoresistive characteristic of the thin film changes slightly after experiments of temperature humidity cycling,salt spray,and molding,it has ability to withstand the harsh conditions of the sea.
magnetron sputteringthin-film strain gaugeresistance temperature coefficientstrain factorenvironmental experiments
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