传感器与微系统2024,Vol.43Issue(2) :110-112.DOI:10.13873/J.1000-9787(2024)02-0110-03

45°倾斜应用的多通道干涉截止滤光片研制

Research and fabrication of multi-channel interference cut-off filter for 45° tilt application

高晓丹 刘岚 姚敏 魏纯
传感器与微系统2024,Vol.43Issue(2) :110-112.DOI:10.13873/J.1000-9787(2024)02-0110-03

45°倾斜应用的多通道干涉截止滤光片研制

Research and fabrication of multi-channel interference cut-off filter for 45° tilt application

高晓丹 1刘岚 1姚敏 1魏纯1
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作者信息

  • 1. 武汉东湖学院电子信息工程学院,湖北武汉 430212
  • 折叠

摘要

光纤通信的发展对通信器件中薄膜滤光片提出了新的要求.根据45°倾斜应用的多通道干涉截止滤光片的设计指标,选择Nb2 O5 和SiO2结合APS1104 型镀膜机的特点,分析了设计膜系的膜层灵敏度和薄膜生长过程中的模拟监控曲线,判断设计薄膜的可镀制性.然后采取直接光学监控方式,选择合适的镀制工艺成功镀制滤光片.测试结果表明:滤光片在45°倾斜应用条件下,1255~1365nm、1475~1502 nm双通带最大插入损耗为0.199 dB,1547~1565 nm为反射带,通带隔离度为17.3 dB,满足系统应用需求.

Abstract

Development of optical fiber communication puts forward new requirements of thin film filters in communication devices.According to the design specifications of multi-channel interference cut-off filter for 45° tilt application,Nb2 O5 and SiO2 are selected as high and low refractive index materials to design irregular,so that it can reduce the influence of polarization effect.Combined with the characteristics of the APS1104 type coating machine,layers sensitivity of the formula and the simulation monitoring curve during thin film growth process are analyzed to judge the producibility of the designed thin-film.Then,the filter is successfully deposited by adopting direct optical monitoring mode and selecting appropriate deposition process.The test results show that under the condition of 45° tilt application,the maximum insertion loss of 1255~1365 nm and 1 475~1 502 nm double passbands is 0.199dB,1547~1565nm is the reflection band,and the passband isolation is17.3dB,which meets the application requirements of the system.

关键词

薄膜/截止滤光片/偏振效应/膜系/非规整层

Key words

thin film/cut-off filter/polarization effect/formula/irregular layer

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基金项目

湖北省教育厅科学技术研究项目(B2022312)

出版年

2024
传感器与微系统
中国电子科技集团公司第四十九研究所

传感器与微系统

CSTPCD北大核心
影响因子:0.61
ISSN:1000-9787
参考文献量4
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