Research on differential structure vector hydrophone technology based on Si nanofilm
Through critical process steps,Si nano membrane is prepared on difference structure hydrophone as varistor,giant piezoresistive effect of silicon nano film is used to improve the sensitivity of hydrophone.Deep silicon etching is used to integrate the silicon column and the chip,which reduces the alignment error of the differential structure and inhibits the vibration interference caused by ocean current.The corresponding photolithography mask and the whole process flow are designed.Through MEMS process,silicon nano film is successfully processed as the varistor,and the integration of vector hydrophone chip and silicon column is realized.The prepared chip is observed and tested.The chip morphology is observed to be good by confocal laser microscope and scanning electron microscope(SEM),and the size is basically consistent with the design.The resistance value of the varistor measured by the semiconductor analyzer is 15.3×104 Ω,which has good linearity and meets the functional requirements of the vector hydrophone.
vector hydrophonesuppression of vibration interferencesilicon nanofilmvaristorMEMS