Cilium MEMS vector hydrophone can detect vector information such as the underwater particle vibration velocity.Integrating with complementary metal oxide semiconductor(CMOS),can greatly improve its performance.A scheme for integration of cilium MEMS vector hydrophone with CMOS is proposed.In the MEMS post-treatment process,the cross beam sensitive structure of the hydrophone is front-side released by sidewall protecting and anisotropic wet etching.The whole post-treatment process does not need lithography,reducing the difficulty of processing while ensuring the precision of processing structure.A verification process is designed,and wet etching processes of four different structures are analyzed concretely.Finally,tape-out of processes of the four structures are achieved and the experimental results are analyzed.The experiment verifies the feasibility of the scheme,which lays a foundation for CMOS integration of cilium MEMS vector hydrophone.
关键词
矢量水听器/互补金属氧化物半导体集成/各向异性湿法腐蚀/侧墙保护/结构释放
Key words
vector hydrophone/complementary metal oxide semiconductor(CMOS)integration/anisotropic wet etching/sidewall protection/structure release
维普
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