Nanopore sequencing,as the latest generation of gene sequencing technology,plays a crucial role in biomedical and clinical applications. MEMS structures in sequencing systems are usually realized using conventional lithography processes,and this paper validates the possibility of realizing MEMS chips in nanopore sequencing systems for the first time using ultraviolet nanoimprint lithography(UV-NIL)process. Three silicon wafers with MEMS bilayer structures for nanopore sequencing are fabricated using conventional lithography. These silicon wafers are used as master plates to precisely replicate their MEMS structure patterns onto PDMS to form imprinted soft molds,which are then imprinted with the desired MEMS structures on silicon substrates using the UV-NIL process. Finally,the effectiveness and feasibility of the UV-NIL process in the fabrication of MEMS chips is successfully demonstrated through both optical and electrical test characterization methods. Compared with traditional lithography,the successful application of UV-NIL will greatly improve process stability and significantly reduce costs.
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