首页|基体偏压幅值对NiCrN薄膜微观结构及力学性能的影响

基体偏压幅值对NiCrN薄膜微观结构及力学性能的影响

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为了进一步提高海洋环境下膜层的使用寿命,采用电弧离子镀技术在304不锈钢基体表面沉积了NiCrN膜层,利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)、X射线光电子能谱(XPS)、纳米压痕仪、多功能材料表面性能试验仪、电化学工作站等测试方法,系统地研究了基体偏压幅值对膜层成分、微观结构、力学性能及耐腐蚀性能的影响.结果表明:膜层主要由金属Cr相、金属Ni相和CrN陶瓷相组成.随着偏压幅值的增加,膜层的厚度、硬度均呈先升高后降低的趋势,在偏压幅值为-150 V时硬度达到最高值2 030 HV.基体偏压幅值为-50 V时的膜层具有最佳的耐磨性能,此时磨损率最低.膜层腐蚀电位随着基体偏压幅值的增大而逐渐正移,腐蚀电流密度逐渐降低,在偏压幅值为-150 V时,膜层的耐腐蚀性能最佳.
Effect of Substrate Bias Voltage Amplitude on the Microstructure and Mechanical Properties of NiCrN Films
To further improve the service life of the films in the marine environment,NiCrN films with different substrate bias voltages were de-posited on a 304 stainless steel substrate by arc ion plating technology.The effects of the substrate bias voltage on the composition,microstruc-ture,mechanical properties and corrosion resistance of the films were systematically investigated using scanning electron microscopy(SEM),X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS),nanoindentation,multifunctional surface properties tester and electro-chemical workstation methods.Results showed that the films were primarily composed of metallic Cr,metallic Ni and CrN ceramic phases.As the bias voltage amplitude increased,the thickness and hardness of the films increased,then decreased.When the bias voltage amplitude was-150 V,the hardness reached the maximum value of 2 030 HV.When the substrate bias amplitude was-50 V,the film had the best wear re-sistance,and the wear rate was the lowest.The corrosion potential of the film shifted positively with the increase of substrate bias amplitude,and the corrosion current density was gradually reduced.When the bias amplitude was-150 V,the corrosion resistance of the film was the best.

arc ion platingNiCrN thin filmmicrostructuremechanical property

赵彦辉、赵鑫、宋贵宏

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上海电子信息职业技术学院中德工程学院,上海 201411

沈阳工业大学材料科学与工程学院,辽宁沈阳 110870

电弧离子镀 NiCrN薄膜 微观组织 力学性能

2024

材料保护
武汉材料保护研究所,中国腐蚀与防护学会 中国表面工程协会

材料保护

CSTPCD
影响因子:1.129
ISSN:1001-1560
年,卷(期):2024.57(12)