材料工程2024,Vol.52Issue(5) :67-75.DOI:10.11868/j.issn.1001-4381.2023.000561

化学气相沉积HfO2涂层的制备及性能

Preparation and properties of HfO2 coatings by chemical vapor deposition

何锐朋 朱利安 王震 叶益聪 李顺 唐宇 白书欣
材料工程2024,Vol.52Issue(5) :67-75.DOI:10.11868/j.issn.1001-4381.2023.000561

化学气相沉积HfO2涂层的制备及性能

Preparation and properties of HfO2 coatings by chemical vapor deposition

何锐朋 1朱利安 1王震 1叶益聪 1李顺 1唐宇 1白书欣1
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作者信息

  • 1. 国防科技大学空天科学学院,长沙 410073
  • 折叠

摘要

采用化学气相沉积(CVD)法在难熔金属Mo表面制备厚约8μm的HfO2涂层.通过HSC Chemistry软件从热力学角度探究CVD HfO2的反应过程,分析HfO2涂层的微观形貌、择优生长情况和纳米力学性能,测试涂层与基体的结合力及抗热震性.结果表明:HfO2涂层与基体结合良好,在经历25~2000℃,100次循环热震后涂层表面未出现宏观剥落;划痕法测定的涂层附着力约23 N;在2.5~5μm波段,涂层表面平均发射率为0.48,将Mo在该波段的平均发射率提高了近5倍.

Abstract

HfO2 coatings with a thickness of approximately 8 μm were prepared on the refractory metals Mo surface by using chemical vapor deposition(CVD),and the reaction process of CVD HfO2 was thermodynamically analyzed by HSC Chemistry.The microscopic morphology,self-oriented growth and nanomechanical properties of HfO2 coatings were analyzed,and the bonding force of the coatings with the substrate and thermal shock resistance were tested.The results show that the HfO2 coating is well bonded to the substrate,and no macroscopic flaking occurs on the surface of the coating after 100 cycles of thermal shock from 25 ℃ to 2000 ℃;the adhesion of the coating is about 23 N as determined by the scratch test;the average emissivity of the surface of the coating is 0.48 in the band of 2.5-5 μm,which improves the average emissivity of Mo in the band by nearly 5 times.

关键词

化学气相沉积/氧化铪涂层/热力学计算/发射率/抗热震性

Key words

CVD/hafnium oxide coating/thermodynamic calculation/emissivity/thermal shock resistance

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基金项目

国家自然科学基金(52071333)

湖南省创新型省份建设专项(湖湘青年英才)(2020RC3034)

出版年

2024
材料工程
中国航发北京航空材料研究院

材料工程

CSTPCD北大核心
影响因子:0.78
ISSN:1001-4381
参考文献量9
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