首页|Electron-beam irradiation induced optical transmittance enhancement for Au/ITO and ITO/Au/ITO multilayer thin films

Electron-beam irradiation induced optical transmittance enhancement for Au/ITO and ITO/Au/ITO multilayer thin films

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Electron beam (EB) irradiation experiments on Au/ITO and ITO/Au/ITO multilayer thin films are reported.The structure and the optical-electrical properties of the samples were investigated by X-ray diffraction,atomic force microscopy,four-point probe resistivity measurement system,and UV-vis-NIR double beam spectrometer,respectively.Those results show that the EB irradiation has the effects of improving the crystalline of samples,widening the optical band gap of both thin films,reducing the sheet resistance,and improving the transmittance of samples.

EB irradiationMultilayer thin filmsStructureOptical-electrical propertiesTransmittance

Wenzuo Wei、Ruijin Hong、Jinxia Wang、Chunxian Tao、Dawei Zhang

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Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China

This work is supported financially by the National Key Research and Development Program of ChinaNational Basic Research Program of China(973 Program)National Natural Science Foundation of China

2016YFB11023032015CB35200161378060

2017

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCDCSCDSCIEI
影响因子：0.657
ISSN：1005-0302
年,卷(期)：2017.33(10)
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