材料科学技术(英文版)2022,Vol.103Issue(8) :232-243.

Defect engineering of water-dispersible g-C3N4 photocatalysts by chemical oxidative etching of bulk g-C3N4 prepared in different calcination atmospheres

Thi Kim Anh Nguyen Thanh-Truc Pham Bolormaa Gendensuren Eun-Suok Oh Eun Woo Shin
材料科学技术(英文版)2022,Vol.103Issue(8) :232-243.

Defect engineering of water-dispersible g-C3N4 photocatalysts by chemical oxidative etching of bulk g-C3N4 prepared in different calcination atmospheres

Thi Kim Anh Nguyen 1Thanh-Truc Pham 2Bolormaa Gendensuren 1Eun-Suok Oh 1Eun Woo Shin1
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作者信息

  • 1. School of Chemical Engineering,University of Ulsan,Daehakro 93,Ulsan 44610,South Korea
  • 2. Department of Material Technology,Faculty of Applied Science,Ho Chi Minh City University of Technology and Education(HCMUTE),No.1 Vo Van Ngan Street,Linh Chieu Ward,Thu Duc District,Ho Chi Minh City 700000,Viet Nam
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Abstract

In this study,water-dispersible graphitic carbon nitride(g-C3N4)photocatalysts were successively pre-pared through the chemically oxidative etching of bulk g-C3N4 that was polymerized thermally in dif-ferent calcination atmospheres such as air,CO2,and N2.The different calcination atmospheres directly influenced the physicochemical and optical properties of both bulk and water-dispersible g-C3N4,chang-ing the photocatalytic degradation behavior of methylene blue(MB)and tetracycline hydrochloride(TC-HCl)for water-dispersible g-C3N4.The bubble-burst process in the thermal polymerization of thiourea produced defective edges containing C=O groups that preferred substituting the C-NHx groups over bulk g-C3N4.In the oxygen-free N2 atmosphere among the different calcination atmospheres,more C=O func-tional groups were generated on the defective edges of bulk g-C3N4,resulting in the highest N vacancy of the tri-s-triazine structure.During the successive chemical oxidation,S-or O-containing functional groups were introduced onto water-dispersible g-C3N4.The water-dispersible g-C3N4 photocatalyst from the oxygen-free N2 atmosphere(NTw)contained the most O-and S-functional groups on the g-C3N4 sur-face.Consequently,NTw exhibited the highest photocatalytic activity in the MB and TC-HCl photodegra-dation because of its slowest recombination process,which was ascribed to the unique surface properties of NTw such as abundant functional groups on the defective edges and N-deficient property.

Key words

g-C3N4/Water-dispersible photocatalyst/Calcination atmosphere/Charge separation/Chemically oxidative etching/Defect edges

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基金项目

National Research Foundation of KoreaNRF)grant funded by the Korea government MSIT(2020R1A4A4079954)

National Research Foundation of KoreaNRF)grant funded by the Korea government MSIT(2021R1A2B5B01001448)

出版年

2022
材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCDCSCDSCI
影响因子:0.657
ISSN:1005-0302
参考文献量73
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