材料科学技术(英文版)2022,Vol.106Issue(11) :243-248.

Top gate engineering of field-effect transistors based on wafer-scale two-dimensional semiconductors

Jingyi Ma Xinyu Chen Yaochen Sheng Ling Tong Xiaojiao Guo Minxing Zhang Chen Luo Lingyi Zong Yin Xia Churning Sheng Yin Wang Saifei Gou Xinyu Wang Xing Wu Peng Zhou David Wei Zhang Chenjian Wu Wenzhong Bao
材料科学技术(英文版)2022,Vol.106Issue(11) :243-248.

Top gate engineering of field-effect transistors based on wafer-scale two-dimensional semiconductors

Jingyi Ma 1Xinyu Chen 1Yaochen Sheng 1Ling Tong 1Xiaojiao Guo 1Minxing Zhang 1Chen Luo 2Lingyi Zong 1Yin Xia 1Churning Sheng 1Yin Wang 1Saifei Gou 1Xinyu Wang 1Xing Wu 2Peng Zhou 1David Wei Zhang 1Chenjian Wu 3Wenzhong Bao1
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作者信息

  • 1. State Key Laboratory of ASIC and System,School of Microelectronics,Fudan University,Shanghai,200433,China
  • 2. In Situ Devices Center,Shanghai Key Laboratory of Multidimensional Information Processing,East China Normal University,Shanghai 200241,China
  • 3. School of Electronic Information,Soochow University,Suzhou,215006,China
  • 折叠

Abstract

The investigation of two-dimensional(2D)materials has advanced into practical device applications,such as cascaded logic stages.However,incompatible electrical properties and inappropriate logic levels re-main enormous challenges.In this work,a doping-free strategy is investigated by top gated(TG)MoS2 field-effect transistors(FETs)using various metal gates(Au,Cu,Ag,and Al).These metals with different work functions provide a convenient tuning knob for controlling threshold voltage(Vth)for MoS2 FETs.For instance,the Al electrode can create an extra electron doping(n-doping)behavior in the MoS2 TG-FETs due to a dipole effect at the gate-dielectric interface.In this work,by achieving matched electrical properties for the load transistor and the driver transistor in an inverter circuit,we successfully demon-strate wafer-scale MoS2 inverter arrays with an optimized inverter switching threshold voltage(VM)of 1.5 V and a DC voltage gain of 27 at a supply voltage(VDD)of 3 V.This work offers a novel scheme for the fabrication of fully integrated multistage logic circuits based on wafer-scale MoS2 film.

Key words

Two-dimensional semiconductor/MoS2/Top gate/Field effect transistor/Logic inverter

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基金项目

National Key Research and De-velopment Program(2016YFA0203900)

Innovation Program of Shanghai Municipal Education Commission(2021-01-07-00-07-E00077)

Shanghai Municipal Science and Technology Commis-sion(21DZ1100900)

National Natural Science Foundation of China(51802041)

National Natural Science Foundation of China(61904032)

National Natural Science Foundation of China(61874154)

出版年

2022
材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCDCSCDSCI
影响因子:0.657
ISSN:1005-0302
参考文献量42
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