首页|Rational design of AgGaS/ZnS/ZnS quantum dots with a near-unity photoluminescence quantum yield via double shelling scheme

Rational design of AgGaS/ZnS/ZnS quantum dots with a near-unity photoluminescence quantum yield via double shelling scheme

扫码查看
In this study,a two-step method was used to synthesize highly luminescent AgGaS/ZnS/ZnS quantum dots(QDs).In the first step,an inner ZnS shell was formed via a one-pot method,which resulted in a smaller lattice mismatch between the AgGaS core and the outer ZnS shell,thereby facilitating the formation of a thick outer shell.After the two-step shelling process,the synthesized AgGaS/ZnS/ZnS QDs showed an excellent photoluminescence quantum yield(PLQY)of 96.4%with a peak wavelength of 508 nm,repre-senting the highest PLQY reported thus far for AgGaS QDs.Furthermore,the effect of halogen ions in Zn precursors on the shelling process was investigated.It was proposed that the capacity of halogen ions to coordinate with the QDs influenced the balance between Zn cation diffusion and ZnS shelling reaction.Specifically,the ZnS shelling reaction was dominant when ZnCl2 was employed,while Zn cation diffusion was the dominant process under the I--rich environment.This work provides insights into the interfacial restructuring during the ZnS shelling and offers a clear map for the tailored synthesis of core/shell QDs.

AgGaSQuantum dotsPhotoluminescenceCore/shellAlloyed core/shell interface

H.X.Lu、H.Liu、Z.Z.Fu、Y.Y.Chen、H.Q.Dai、Z.Hu、W.L.Zhang、R.Q.Guo

展开 >

Institute for Electric Light Sources,School of Information Science and Technology,Fudan University,Shanghai 200433,China

Institute of Future Lighting,Academy for Engineering and Technology,Fudan University,Shanghai 200433,China

Yiwu Research Institute of Fudan University,Yiwu,Zhejiang 322000,China

Zhongshan-Fudan Joint Innovation Center,Zhongshan 528437,China

展开 >

国家自然科学基金Zhongshan-Fudan Joint Innovation Center,Jihua Laboratory Projects of Guangdong ProvinceShanghai Postdoctoral Excellence ProgramShanghai Rising-Star Program

62074044X190111UZ190202101622YF1402000

2024

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCD
影响因子:0.657
ISSN:1005-0302
年,卷(期):2024.169(2)
  • 59