首页|Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings

Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings

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The presence of excess Ta in high-temperature protective coatings can compromise the integrity of the Al2O3 scale on the surface,which has a negative impact on the oxidation behavior and reduces the service life.The effects of oxygen doping on the isothermal oxidation of three sputtered nanocrystalline coatings were investigated at 1100 ℃.The results indicated that oxygen doping inhibited the diffusion of Ta from the coating to the oxide scale,which was primarily attributed to the preferential oxidation of the Al in the coating.However,excess oxygen doping decreased the amount of Al available for the formation of the Al2O3 scale on the coating,thus reducing the inhibitory effect on Ta oxidation.Moreover,doping with excess O caused spalling of the oxide scale.Therefore,the right balance in O doping is crucial for suppressing Ta oxidation while maintaining the integrity of the oxide scale.

High-temperature oxidationOxygen dopingNanocrystalline coatingTa-rich phaseResidual stress

Bo Meng、Lanlan Yang、Qunchang Wang、Jinlong Wang、Minghui Chen、Shenglong Zhu、Fuhui Wang

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Shenyang National Laboratory for Materials Science,Northeastern University,Shenyang 110819,China

School of Materials Science and Engineering,Jiangsu University of Science and Technology,Zhenjiang 212003,China

Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China

National Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaFundamental Research Funds for the Central UniversitiesMinistry of Industry and Information Technology Project

5167105351801021N2302007MJ-2017-J-99

2024

10.1016/j.jmst.2023.11.005

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCD
影响因子：0.657
ISSN：1005-0302
年,卷(期)：2024.184(17)
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