Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings

Bo Meng ¹Lanlan Yang ²Qunchang Wang ¹Jinlong Wang ¹Minghui Chen ¹Shenglong Zhu ³Fuhui Wang³

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作者信息

1. Shenyang National Laboratory for Materials Science,Northeastern University,Shenyang 110819,China
2. School of Materials Science and Engineering,Jiangsu University of Science and Technology,Zhenjiang 212003,China
3. Shenyang National Laboratory for Materials Science,Northeastern University,Shenyang 110819,China;Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China
折叠

Abstract

The presence of excess Ta in high-temperature protective coatings can compromise the integrity of the Al2O3 scale on the surface,which has a negative impact on the oxidation behavior and reduces the service life.The effects of oxygen doping on the isothermal oxidation of three sputtered nanocrystalline coatings were investigated at 1100 ℃.The results indicated that oxygen doping inhibited the diffusion of Ta from the coating to the oxide scale,which was primarily attributed to the preferential oxidation of the Al in the coating.However,excess oxygen doping decreased the amount of Al available for the formation of the Al2O3 scale on the coating,thus reducing the inhibitory effect on Ta oxidation.Moreover,doping with excess O caused spalling of the oxide scale.Therefore,the right balance in O doping is crucial for suppressing Ta oxidation while maintaining the integrity of the oxide scale.

Key words

High-temperature oxidation/Oxygen doping/Nanocrystalline coating/Ta-rich phase/Residual stress

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基金项目

National Natural Science Foundation of China(51671053)

National Natural Science Foundation of China(51801021)

Fundamental Research Funds for the Central Universities(N2302007)

Ministry of Industry and Information Technology Project(MJ-2017-J-99)

出版年

2024

材料科学技术(英文版)

中国金属学会中国材料研究学会中国科学院金属研究所

材料科学技术(英文版)

CSTPCDCSCD

影响因子：0.657

ISSN：1005-0302

参考文献量37

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