首页|PEDOT:PSS-patched magnetic graphene films with tunable dielectric genes for electromagnetic interference shielding and infrared stealth

PEDOT:PSS-patched magnetic graphene films with tunable dielectric genes for electromagnetic interference shielding and infrared stealth

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The intelligent era brings electronics closer to humans,but also produces a large scale of electromag-netic(EM)radiation simultaneously,which causes serious harm to health and high sophisticated equip-ment.Exploring the underlying response logic of EM materials is urgently needed to face the challenge of EM interference(EMI)and secondary EM pollution better.Herein,PEDOT:PSS-patched magnetic graphene films are fabricated by vacuum-assisted molecular patching engineering,with tunable EM wave response.Based on the observation of micro-nano structure,the dielectric genes are visually revealed,which offers a bran-new horizon for the optimization of EM properties.Impressively,the constructed films achieve double band shielding toward gigahertz wave and infrared radiation.The optimal EMI shielding efficiency exceeds 99％,and covers the entire X-band.Meanwhile,the green shielding index rises from 0.3 to 0.6,indicating that it is a potential green EMI shielding materials.Furthermore,the periodic macroscopic interfaces and the inherent thermal anisotropy endow the films with thermal insulation and flexible in-frared stealth functions in simulated thermal environments.This work refreshes the insight into multi-band shielding,providing a new idea to EM energy governance.

PEDOT:PSS-patched magnetic graphene filmsVacuum-assisted molecular patching engineeringDielectric genesElectromagnetic interference shieldingThermal stealth

Jin-Cheng Shu、Yu-Ze Wang、Mao-Sheng Cao

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School of Materials Science and Engineering,Beijing Institute of Technology,Beijing 100081,China

National Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of China

5237328052177014522732575197700911774027

2024

10.1016/j.jmst.2023.10.046

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCD
影响因子：0.657
ISSN：1005-0302
年,卷(期)：2024.186(19)
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