首页|Size effect of amorphous layers on radiation resistance in Cu/Nb multilayers

Size effect of amorphous layers on radiation resistance in Cu/Nb multilayers

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Zhe Yan、Wenfan Yang、Jingyu Pang、Jiahao Yao、Jian Zhang、Lixin Yang、Shijian Zheng、Jian Wang、Xiuliang Ma

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Tianjin Key Laboratory of Materials Laminating Fabrication and Interface Control Technology,School of Materials Science and Engineering,Hebei University of Technology Tianjin 300130,China

Shenyang National Laboratory for Materials Science,Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China

Beijing Institute of Technology Chongqing Innovation Center,Chongqing 401120,China

School of Energy Research,Xiamen University,Xiamen 361005,China

Tianjin Key Laboratory of Materials Laminating Fabrication and Interface Control Technology,School of Materials Science and Engineering,Hebei University of Technology,Tianjin 300130,China

Mechanical and Materials Engineering,University of Nebraska-Lincoln,Lincoln,NE 68588,USA

Bay Area Center for Electron Microscopy,Songshan Lake Materials Laboratory,Dongguan 523808,China

Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China

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key project of the Natural science Foundation of Tianjinkey project of the Natural Science Foundation of HebeiNational Natural Science Foundation of ChinaCentral Guidance on Local Science and Technology Development Fund of Hebei Province

20JCZDJC00440E202120213552071124226Z1012G

2024

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCD
影响因子:0.657
ISSN:1005-0302
年,卷(期):2024.197(30)