首页|Oxygen vacancy-rich CoMoO4/Carbon nitride S-scheme heterojunction for boosted photocatalytic H2 production:Microstructure regulation and charge transfer mechanism

Oxygen vacancy-rich CoMoO4/Carbon nitride S-scheme heterojunction for boosted photocatalytic H2 production:Microstructure regulation and charge transfer mechanism

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Developing highly efficient S-scheme photocatalysts is a subject of immense interest for harnessing so-lar energy towards sustainable hydrogen production.Herein,a novel S-scheme heterojunction of oxygen vacancy-rich CoMoO4/CN(CMO/CN)photocatalyst was rationally constructed through loading CoMoO4 nanorods on carbon nitride(CN)nanosheets via a direct one-pot calcination method.The CMO/CN S-scheme heterojunction exhibited enhanced surface area,fine CN dispersion,rich oxygen vacancies,and accelerated charge separation/transfer efficiency,which were conducive to improving photocatalytic H2 evolution performance.Of note,the optimal 3%CMO/CN sample displayed the highest H2 production rate of 8.35 mmol g-1 h-1,which is 4.6 folds that of pristine CN.In situ irradiated X-ray photoelectron spectroscopy(XPS)and electron paramagnetic resonance(EPR)characterizations confirmed the S-scheme charge transfer path between CN and CMO,which greatly promoted spatial charge separation.Density functional theory(DFT)calculations together with contact angle tests revealed the reduced activation energies for H2O dissociation and enhanced hydrophilicity of the CMO/CN.The CMO/CN photocatalysts also presented high stability and fine reusability.This work may provide insights into the combination of defect engineering and heterojunction designing for high-efficiency solar-to-chemical energy conversion.

S-schemeCoMoO4Carbon nitrideOxygen vacancyPhotocatalysis

Jiani Qin、Yanli Dong、Xiaojuan Lai、Bo Su、Bao Pan、Chuanyi Wang、Sibo Wang

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School of Environmental Science and Engineering,Shaanxi University of Science and Technology,Xi'an 710021,China

State Key Laboratory of Photocatalysis on Energy and Environment,College of Chemistry,Fuzhou University,Fuzhou 350116,China

Key Laboratory of Chemical Additives for China National Light Industry,School of Chemistry and Chemical Engineering,Shaanxi University of Science and Technology,Xi'an 710021,China

2024

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

CSTPCD
影响因子:0.657
ISSN:1005-0302
年,卷(期):2024.198(31)