首页|Construction of S-scheme cyano-modified g-C3N4/TiO2 film with boosted charge transfer and highly hydrophilic surface for enhanced photocatalytic degradation of norfloxacin

Construction of S-scheme cyano-modified g-C3N4/TiO2 film with boosted charge transfer and highly hydrophilic surface for enhanced photocatalytic degradation of norfloxacin

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Developing highly efficient and recyclable photocatalysts has been regarded as an attractive strategy to solve antibiotic contaminants.Herein,we designed and fabricated Cy-C3N4/TiO2 S-scheme heterojunction film with boosted charge transfer and a highly hydrophilic surface.The as-prepared heterojunction ex-hibited outstanding removal efficiency on tetracyclines and fluoroquinolone antibiotics(more than 80%within 90 min).The removal rate of 300-Cy-C3N4/TiO2 on norfloxacin(NOR)was 2.12,and 1.59 times higher than that of pristine TiO2,C3N4/TiO2,respectively.The excellent photocatalytic performance of 300-Cy-C3N4/TiO2 was attributed to the highly hydrophilic surface and effective transfer and separation of carriers.Moreover,the NOR degradation pathways were proposed based on the results of density func-tional theory(DFT),and liquid chromatography-mass spectrometry.The toxicity assessment indicated the toxicity of intermediates can be remarkably alleviated.The DFT calculation and selective photo-deposition experiment demonstrated that an internal electric field was formed at the heterojunction interface,and the charge carriers migrated between Cy-C3N4 and TiO2 following an S-scheme transfer pathway.This research not only provides a promising method for tracking charge distribution on thin-film heterojunc-tion photocatalysts but also helps us to design high-efficiency,and recyclable heterojunctions to solve antibiotic contaminants.

Cyano groupCarbon nitrideNorfloxacinDFT calculationS-scheme heterojunction

Wei Gan、Ruixin Chen、Li Zhang、Jun Guo、Miao Zhang、Yuqing Lu、Zhaoqi Sun、Xucheng Fu

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College of Materials and Chemical Engineering,West Anhui University,Lu'an 237015,China

School of Materials Science and Engineering,Anhui University,Hefei 230601,China

School of Electronic Engineering Huainan Normal University,Huainan 232038,China

2025

材料科学技术(英文版)
中国金属学会 中国材料研究学会 中国科学院金属研究所

材料科学技术(英文版)

影响因子:0.657
ISSN:1005-0302
年,卷(期):2025.206(3)