首页|Field emission from Si tips coated with nanocrystalline diamond films
Field emission from Si tips coated with nanocrystalline diamond films
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
万方数据
维普
The electron field emission from Si tips coated with nanocrystalline diamond films was investigated. The Si tips were formed by plasma etching, and nano-diamond films were deposited on the Si tips by hot filament chemical vapor deposition. The radius of curvature for the Si tips was averagely about 50 nm. The microstructure of the diamond films was examined by scanning electron microscopy and Raman spectroscopy. The field emission properties of the samples were measured in an ionpumped vacuum chamber at a pressure of 10-6 Pa. The experimental results showed that the nanostructured films on Si tips exhibited a lower value of the turn-on electric field than those on flat Si substrates. It was found that the tip shape and nondiamond phase in the films had a significant effect on the field emission properties of the films.
nanocrystalline diamondfield emissionSi tipsCVD, diamond films
WANG Wanlu、Liao Kejun、LIU Gaobin、MA Yong
展开 >
College of mathematics and Sciences, Chongqing University, Chongqing 400044, P.R.China
NETL
NSTL
万方数据
维普
