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稳定剂对化学镀镍性能的影响

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为了研究稳定剂对化学镀镍液稳定性及镀层性能的影响,在基础化学镀镍液中分别加入了碘化钾、柠檬酸铈和硫脲3种稳定剂,制备了化学镀镍液和化学镀镍层.利用氯化钯溶液测试镀液稳定性,采用XF-P1M镀层测厚及材料分析仪、显微硬度计、金相显微镜、电化学工作站以及粗糙度测量仪对镀层的厚度、磷含量、硬度、微观形貌、耐蚀性以及粗糙度进行了表征.结果表明:以碘化钾作为稳定剂的镀液效果最好,镀液分解时间由198 s提高至375 s;镀速降低最少,为5.60 μm/h;镀层硬度由271 HV提高至307 HV;磷含量基本无变化;镀层结晶更加致密且均匀,孔隙率降低;测得镀层的自腐蚀电位为-0.348 V,化学镀镍层的自腐蚀电流密度为2.924×10-7 A/cm2,镀层的耐蚀性能最佳;粗糙度最低,为0.659 μm.
Effect of stabilizers on the properties of electroless nickel plating
To investigate the effect of stabilizers on the stability and coating performance of the electroless nickel solution,three stabilizers containing potassium iodide,cerium citrate and thiourea were added to the electroless nickel solution to prepare the electroless nickel coatings.Palladium chloride solution was used to test the stability of plating solution.The thickness,phosphorus content,hardness,microstructure,corrosion resistance,and roughness of the coating were characterized using XF-P1M coating thickness measurement and material analyzer,microhardness tester,metallographic microscope,electrochemical workstation,and roughness measuring instrument.The results showed that the stabilizer containing potassium iodide had the best effect,and the decomposition time of the plating solution increased from 198 s to 375 s,the minimum reduction in coating rate was 5.60 μm/h,the hardness increased from 271 HV to 307 HV,the phosphorus content remained substantially unchanged,the crystallization of the coating was much denser and more uniform,and the porosity was reduced.The measured self-corrosion potential of the coating is-0.348 V,and the self-corrosion current density of the coating is 2.924×10-7 A·cm-2,which shows the best corrosion resistance.The lowest roughness is 0.659 μm.

stabilizercorrosion resistanceNi-P alloy

唐方宇、湛延基、王春霞、刘慧

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西凡仪器(深圳)有限公司,广东 深圳 518000

南昌航空大学 材料学院,江西 南昌 330063

稳定剂 耐蚀性 Ni-P合金

2024

电镀与精饰
天津市电镀工程学会

电镀与精饰

CSTPCD北大核心
影响因子:0.522
ISSN:1001-3849
年,卷(期):2024.46(8)
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