首页|氯化钾无氰镀镉工艺的边界条件

氯化钾无氰镀镉工艺的边界条件

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介绍了氯化钾无氰镀镉工艺的研究开发过程,依据实验室试验与生产实践制定了工艺边界条件.氯化镉25g/L~35g/L,氯化钾 80g/L~140g/L,PULIZIERNCC-617AC 络合剂 100g/L~140g/L,PULIZIERNCC-617Base辅助剂 25 mL/L~30 mL/L,PULIZIERNCC-617 Bri 光亮剂 1.5 mL/L~2.5 mL/L,PULIZIERNCC-617 HCD 高区光亮剂5 mL/L~10 mL/L,镀槽温度20 ℃~35 ℃,pH值7~9,阴极电流密度0.5 A/dm2~1.5 A/dm2(可放宽至0.5 A/dm2~2.0 A/dm2),阴极移动2m/min~4 m/min,阳极采用镉的质量分数≥99.97%的镉板.在实验室制备钢铁表面无氰镀镉及六价铬彩色钝化样件,进行中性盐雾试验20064h样件表面无白锈.本工艺在镀层耐蚀性方面取得了重大进步,具有良好的应用前景.
Boundary conditions for the cyanide-free potassium chloride cadmium plating
The research and development process of cyanide-free potassium chloride cadmium plating was introduced.The boundary conditions of the process were established according to laboratory experiment and production practice.Cadmium chloride is 25 g/L-35 g/L,potassium chloride 8 g/L-140 g/L,PULIZIER NCC-617 AC complexing agent 100-140 g/L,PULIZIER NCC-617 Base adjuvant 25 mL/L-30 mL/L,PULIZIER NCC-617 Bri brightener 1.5-2.5 mL/L,PULIZIER NCC-617 HCD high zone brightener 5 mL/L-10 mL/L,plating bath temperature is 20 ℃-35 ℃,range of pH is 7-9,the cathode current density 0.5 A/dm2-1.5 A/dm2(can be relaxed to 0.5 A/dm2-2.0 A/dm2),the cathode moves 2-4 m/min,and the anode adopts cadmium plate with cadmium mass fraction ≥ 99.97%.The samples of cyanide-free cadmium plating and chromium-hexavalent color passivation on the surface of steel were prepared in the laboratory,and no white rust was found on the surface of the samples after the neutral salt spray test 20064 h.This process has made great progress in the corrosion resistance of the coating and has a good application prospect.

cyanide-free cadmium platingcadmium chloridepotassium chloridecomplexing agentbrighteneradjuvantboundary conditionscorrosion resistance of coating

郭崇武、詹兴刚、王大铭、代朋民、杨强、杨开迪

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广州超邦化工有限公司,广东 广州 510460

贵州航天精工制造有限公司,贵州遵义 563000

中航力源液压股份有限公司,贵州贵阳 550018

中航工业贵州华烽电器有限公司,贵州贵阳 550006

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无氰镀镉 氯化镉 氯化钾 络合剂 光亮剂 辅助剂 边界条件 镀层耐蚀性

2024

电镀与精饰
天津市电镀工程学会

电镀与精饰

CSTPCD北大核心
影响因子:0.522
ISSN:1001-3849
年,卷(期):2024.46(12)