首页|Formation mechanism of bright and dark concentric-ring pattern in dielectric barrier discharge

Formation mechanism of bright and dark concentric-ring pattern in dielectric barrier discharge

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In this work,a bright and dark concentric-ring pattern is reported in a dielectric barrier discharge for the first time.The spatiotemporal dynamics of the bright and dark concentric-ring pattern are investigated with an intensified charge-coupled device and photomultiplier tubes.The results indicate that the bright and dark concentric-ring pattern is composed of three concentric-ring sublattices.These are bright concentric-ring structures,dark concentric-ring structures and wider concentric-ring structures,respectively.The bright concentric-ring structures and dark concentric-ring structures are alternately distributed.The bright concentric-ring structures are located at the centre of the wider concentric-ring structures.The wider concentric-ring structures first form from the outer edge and gradually develop to the centre.The essence of all three concentric-ring structures is the individual discharge filaments.The optical emission spectra of different sublattices are acquired and analysed.It is found that the plasma parameters of the three concentric-ring sublattices are different.Finally,the formation mechanism of the bright and dark concentric-ring pattern is discussed.

dielectric barrier discharge(DBD)concentric-ring patternspatio-temporal dynamicsoptical emission spectroscopywall charges

李彩霞、冯建宇、王舒畅、李骋、冉俊霞、潘宇扬、董丽芳

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College of Electronic Information Engineering,Hebei University,Baoding 071002,People's Republic of China

College of Physics Science and Technology,Hebei University,Baoding 071002,People's Republic of China

School of Energy and Environmental Engineering,Hebei University of Technology,Tianjin 300401,People's Republic of China

College of Quality and Technical Supervision,Hebei University,Baoding 071002,People's Republic of China

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2024

10.1088/2058-6272/ad386a

等离子体科学和技术(英文版)
中国科学院合肥物质科学研究所 中国力学学会

等离子体科学和技术(英文版)

EI
影响因子：0.297
ISSN：1009-0630
年,卷(期)：2024.26(8)