首页|Investigation of an electrode-driven hydrogen plasma method for in situ cleaning of tin-based contamination

Investigation of an electrode-driven hydrogen plasma method for in situ cleaning of tin-based contamination

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To prolong the service life of optics,the feasibility of in situ cleaning of the multilayer mirror(MLM)of tin and its oxidized contamination was investigated using hydrogen plasma at different power levels.Granular tin-based contamination consisting of micro-and macroparticles was deposited on silicon via physical vapor deposition(PVD).The electrode-driven hydrogen plasma at different power levels was systematically diagnosed using a Langmuir probe and a retarding field ion energy analyzer(RFEA).Moreover,the magnitude of the self-biasing voltage was measured at different power levels,and the peak ion energy was corrected for the difference between the RFEA measurements and the self-biasing voltage(ERFEA-eVself).XPS analysis of O Is and Sn 3d peaks demonstrated the chemical reduction process after 1 W cleaning.Analysis of surface and cross-section morphology revealed that holes emerged on the upper part of the macroparticles while its bottom remained smooth.Hills and folds appeared on the upper part of the microparticles,confirming the top-down cleaning mode with hydrogen plasma.This study provides an in situ electrode-driven hydrogen plasma etching process for tin-based contamination and will provide meaningful guidance for understanding the chemical mechanism of reduction and etching.

tin-based contaminationhydrogen plasmain situ cleaningion energy

彭怡超、叶宗标、王思蜀、蒲国、刘显洋、苑聪聪、廖加术、韦建军、余新刚、苟富均

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Key Laboratory of Radiation Physics and Technology,Ministry of Education,Institute of Nuclear Science and Technology,Sichuan University,Chengdu 610064,People's Republic of China

Institute of Atomic and Molecular Physics,Sichuan University,Chengdu 610064,People's Republic of China

Institute of High Performance Scientific Computation,Xihua University,Chengdu 610039,People's Republic of China

School of Engineering Science,University of Chinese Academy of Sciences,Beijing 100049,People's Republic of China

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2024

等离子体科学和技术(英文版)
中国科学院合肥物质科学研究所 中国力学学会

等离子体科学和技术(英文版)

EI
影响因子:0.297
ISSN:1009-0630
年,卷(期):2024.26(8)