China is in the rapid development stage of upgrading key industries such as electronics and semiconductors,and the supply of supporting raw materials for related industries has always been highly concerned.High-purity electronic grade boron trifluoride-11 B gas is a key ion source for semiconductor ion implantation and has wide applications in the field of e-lectronics.The development status of boron trifluoride-11 B at home and abroad in recent years,the preparation methods,purification processes and the advantages and disadvantages of various processes of boron trifluoride-11 B are introduced.It also lists boron isotope separation technology and detection analysis methods.In industrial production,joint methods such as distillation,adsorption,and chemical conversion will be adopted to produce boron trifluoride-11 B on an industrial scale,which has certain reference value and guiding significance.
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