电子级三氟化硼-11B的合成与纯化、分析技术研究进展
Progress in Synthesis,Purification and Analysis of Electronic Grade Boron Trifluoride-11 B
付豪 1张金彪 1郭琼 1何红振 1铁宁 1袁胜芳1
作者信息
- 1. 昊华气体有限公司,河南 洛阳 471012
- 折叠
摘要
我国处在电子和半导体等关键产业升级的快速发展阶段,相关产业配套原材料供给问题一直备受关注.高纯电子级三氟化硼-11 B气体是半导体离子注入的关键离子源,在电子产业领域应用广泛.介绍了近几年三氟化硼-11 B的国内外发展现状,三氟化硼-11 B的合成方法、纯化工艺和各种工艺的优缺点,列举了硼同位素分离技术和检测分析方法.在工业生产中会采取精馏、吸附、化学转化等联合的方法对三氟化硼-11 B进行产业化生产,具有一定的参考价值和指导意义.
Abstract
China is in the rapid development stage of upgrading key industries such as electronics and semiconductors,and the supply of supporting raw materials for related industries has always been highly concerned.High-purity electronic grade boron trifluoride-11 B gas is a key ion source for semiconductor ion implantation and has wide applications in the field of e-lectronics.The development status of boron trifluoride-11 B at home and abroad in recent years,the preparation methods,purification processes and the advantages and disadvantages of various processes of boron trifluoride-11 B are introduced.It also lists boron isotope separation technology and detection analysis methods.In industrial production,joint methods such as distillation,adsorption,and chemical conversion will be adopted to produce boron trifluoride-11 B on an industrial scale,which has certain reference value and guiding significance.
关键词
三氟化硼-11B/纯化/硼同位素分离Key words
boron trifluoride-11 B/purification/boron isotope separation引用本文复制引用
出版年
2024
NETL
NSTL
万方数据