With the advancement of microelectronics technology towards the nanoscale,the development of high-performance dielectric materials has become the key to improving the performance of integrated circuits.Atomic Layer Deposition(ALD)technology shows great potential in the preparation of high-performance Al2O3 dielectric materials due to its excellent film uniformity,precise thickness control,and good interface properties.It focuses on the experimental teaching content of ALD method for preparing Al2O3 high-performance dielectric materials is designed for related majors such as microelectronics science and engineering and integrated circuits.By introducing the principles of ALD deposition technology,knowledge related to Al2O3 dielectric films,experimental operation procedures,characterization and analysis of Al2O3 dielectric films and other process designs.It aims to cultivate and improve students'practical and innovative abilities.
关键词
原子层沉积/介电/Al2O3/教学研究
Key words
atomic layer deposition/dielectric/Al2O3/teaching research
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