电源学报2024,Vol.22Issue(3) :138-145,164.DOI:10.13234/j.issn.2095-2805.2024.3.138

SiC MOSFET驱动特性及器件国产化后的影响分析

Driving Characteristics of SiC MOSFET and Influence Analysis after Device Localization

姚常智 张昊东 申宏伟 王建军
电源学报2024,Vol.22Issue(3) :138-145,164.DOI:10.13234/j.issn.2095-2805.2024.3.138

SiC MOSFET驱动特性及器件国产化后的影响分析

Driving Characteristics of SiC MOSFET and Influence Analysis after Device Localization

姚常智 1张昊东 1申宏伟 1王建军1
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作者信息

  • 1. 北京航天发射技术研究所,北京 100076
  • 折叠

摘要

碳化硅金属氧化物半导体场效应晶体管SiC MOSFET(silicon carbide metal-oxide-semiconductor field-effect transistor)作为一种新型、广泛应用的开关器件,在实际应用中具有更快的开关速度和更低的器件损耗,可以提高变换器的效率,体现更好的性能.针对SiC MOSFET驱动特性,分析寄生参数对其的影响;搭建双脉冲实验平台,分析栅源电压与SiC MOSFET导通时间的关系;针对现有国产SiC MOSFET存在的不足之处,基于搭建的实验平台及其他电源产品,对SiC MOSFET进行国产化器件替代后导通时间、驱动损耗及负压幅值变化的相关分析.

Abstract

As a novel and extensively applied switching device, silicon carbide metal-oxide-semiconductor field-ef fect transistor(SiC MOSFET) offers a faster switching speed and lower device loss in practical applications, thereby en-hancing the converter efficiency and delivering a superior performance. Aimed at the driving characteristics of SiC MOS-FET, the influence of parasitic parameters on its performance was analyzed. To investigate the relationship between the gate-source voltage and turn-on time of SiC MOSFET, a two-pulse experimental platform was also established. However, there are certain drawbacks with the existing domestic SiC MOSFET. Based on the experimental platform and other power products, the changes in conduction time, driving loss and negative voltage amplitude after replacing the imported SiC MOSFET with domestic devices were analyzed.

关键词

碳化硅金属氧化物半导体场效应晶体管/寄生参数/栅源电压/国产化

Key words

Silicon carbide metal-oxide-semiconductor field-effect transistor(SiC MOSFET)/parasitic parameter/gate-source voltage/localization

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出版年

2024
电源学报
中国电源学会,国家海洋技术中心

电源学报

北大核心
影响因子:0.7
ISSN:
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