首页|透射电镜强磁场原位样品台的研发及其应用

透射电镜强磁场原位样品台的研发及其应用

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本文介绍了一种可施加水平强磁场的透射电镜样品台.通过降低磁场发生端面沿电子束方向的厚度,实现了增加磁场强度时较小的电子束偏折角度,在施加较强水平磁场的情况下仍然可以清晰地成像.在加速电压为200 kV的透射电镜中能够施加的最大磁场数值为0.75 T,远高于国际上现有装置的数值.利用该样品台成功观察了饱和磁场为0.6 T的AlNiCo磁体样品的磁化过程.
Development of in-situ magnetizing holder for transmission electron microscope and its application
In this paper,we developed an in-situ magnetizing holder for transmission electron microscope with a strong in-plane magnetic field.By reducing the thickness of pole surface along electron beam direction,a small deflection angle of electron beam was realized when the intensity of magnetic field was increased.A clear image was obtained under a strong in-plane field.The maximum field strength was estimated to be 0.75 T by calculating the field distribution through finite element method and measuring the beam deflection angle,much higher than ever reported values.The magnetization process of AlNiCo sample with a saturation field of 0.6 T was observed by the holder inside of TEM operated at 200 kV,confirming the field strength and the good imaging condition of the developed holder.

In-situ magnetizing holderLorentz microscopymagnetic domainAlNiCo

孙鑫、覃家转、白天、赵之赫、夏卫星、陈仁杰、闫阿儒

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宁波大学材料科学与化学工程学院,浙江宁波 315211

稀土永磁材料联合创新中心,中国科学院宁波材料技术与工程研究所,浙江宁波 315201

原位磁场样品台 洛伦兹透射电镜 磁畴 铝镍钴

宁波市重大科技任务攻关项目宁波材料技术与工程研究所所长基金

2023Z099E21301QF01

2024

电子显微学报
中国物理学会

电子显微学报

CSTPCD北大核心
影响因子:0.431
ISSN:1000-6281
年,卷(期):2024.43(3)
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