首页|TSV阵列在温度循环下的晶格变化对电学性能影响的研究

TSV阵列在温度循环下的晶格变化对电学性能影响的研究

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针对TSV(Through Silicon Via,硅通孔)热机械可靠性较差且其结构特性变化对电学性能影响情况不明的问题,基于一种TSV阵列叉指电极对样品开展了-55~125℃的温度循环试验,测试了温循后阵列电极的电学性能与边界绝缘性能变化,跟踪测试了TSV铜柱的几何尺寸变化,对比分析了试验前后TSV结构的形貌和晶格特性等衍化规律.结果表明,温度循环载荷导致了TSV-Cu晶粒向上生长、铜柱体积变大、微观结构缺陷产生以及电学性能退化;此外,还定量地构建了晶格特性变化对TSV阵列电极电学性能影响的关系架构,具有一定的工程意义.
Effect of lattice changes on electrical properties of TSV array during thermal cycling
In order to solve the problem of poor thermo-mechanical reliability of TSV(Through silicon via)and clarify the influence of its structural characteristic changes on electrical properties,the thermal cycling tests were carried out on the samples based on TSV array interdigital electrode at-55-125℃.The changes of the electrical properties and boundary insulation properties of the array electrode after thermal cycling were measured,and the geometric changes of TSV copper columns were tracked.The morphology and lattice characteristics of TSV structure before and after the test were compared and analyzed.The results show that temperature cyclic loading leads to TSV-Cu grain growth,copper column volume enlargement,microstructure defects generation and electrical properties degradation.In addition,the relationship of the influence of the lattice characteristics on the electrical properties of TSV array electrodes was constructed quantitatively,which has substantial engineering significance.

TSV arraythermal cyclinginsulating propertymicrostructural defectlattice feature changes

梁堃、王月兴、何志刚、赵伟

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中国工程物理研究院 电子工程研究所, 四川 绵阳 621999

中国工程物理研究院 计量测试中心, 四川 绵阳 621999

TSV阵列 温度循环 绝缘性能 微观缺陷 晶格特性变化

国家自然科学基金

12305313

2024

电子元件与材料
中国电子学会 中国电子元件行业协会 国营第715厂(成都宏明电子股份有限公司)

电子元件与材料

CSTPCD北大核心
影响因子:0.491
ISSN:1001-2028
年,卷(期):2024.43(1)
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