电子元件与材料2024,Vol.43Issue(8) :988-993.DOI:10.14106/j.cnki.1001-2028.2024.0283

AlN基板表面状态对AlN-AMB覆铜板剥离强度影响机理的研究

The mechanism of the influence of AlN substrate surface on peeling strength of AlN-AMB substrate

许海仙 曾祥勇 朱家旭 耿春磊 詹俊 汤文明
电子元件与材料2024,Vol.43Issue(8) :988-993.DOI:10.14106/j.cnki.1001-2028.2024.0283

AlN基板表面状态对AlN-AMB覆铜板剥离强度影响机理的研究

The mechanism of the influence of AlN substrate surface on peeling strength of AlN-AMB substrate

许海仙 1曾祥勇 2朱家旭 3耿春磊 1詹俊 1汤文明4
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作者信息

  • 1. 中国电子科技集团公司第43 研究所,安徽 合肥 230088;合肥圣达电子科技实业有限公司,安徽 合肥230088
  • 2. 中国电子科技集团公司第43 研究所,安徽 合肥 230088
  • 3. 合肥圣达电子科技实业有限公司,安徽 合肥230088
  • 4. 合肥工业大学 材料科学与工程学院,安徽 合肥 230009;微系统安徽省重点实验室,安徽 合肥 230088
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摘要

为了探究AlN基板表面状态对AlN-AMB覆铜板剥离强度影响的机理,对研磨型和即烧型两类AlN基板表面的微观形貌及其制备的AlN-AMB覆铜板界面反应层、断面和断层微观显微结构进行分析.结果表明,即烧型AlN基板表面平整、致密,其制备的AlN-AMB覆铜板界面反应层平整、致密,铜与AlN基板剥离的断层位于基体内部,Cu发生明显塑性变形,剥离强度高达19.053 N/mm.而研磨型AlN基板表面存在微裂纹和碎晶粒,由其制备的AlN-AMB覆铜板界面反应层凹凸不平,且不连续,钎料渗入AlN基板亚表层的微裂纹中,易于诱发应力集中,铜与AlN基板剥离的断层位于AlN基体的亚表层,Cu塑性变形小,剥离强度只有5.789 N/mm.

Abstract

In order to disclose the mechanism of the influence of AlN substrate surface condition on the peeling strength of AlN-AMB substrate,the surface microstructure of the lapping type and fired type AlN substrates and the microstructure of interface reaction layer,cross section and fault of AlN-AMB substrates prepared by them were analyzed. The results show that the surface of the fired AlN substrate is compact and flat,and the interface reaction layer of the AlN-AMB substrate prepared by the fired AlN substrate is compact and flat. The fault is located in the AlN matrix,and the plastic deformation of Cu is obvious,the peeling strength is up to 19.053 N/mm. Whereas,there are microcracks and granular grains on the surface of the lapping AlN substrate. The reaction layer of the AlN-AMB substrate prepared by the lapping AlN substrate is uneven and discontinuous,the solder penetrates into the microcracks in the subsurface of the AlN substrate,which is easy to induce stress concentration. The fault is located in the subsurface of the AlN substrate. The plastic deformation of Cu is small,and the peeling strength is as low as 5.789 N/mm.

关键词

氮化铝基板/AlN-AMB/活性金属钎焊/显微组织/剥离强度

Key words

AlN substrate/AlN-AMB/active metal brazing/microstructure/peeling strength

引用本文复制引用

基金项目

安徽省重大科技专项(202003a05020006)

安徽省重点研究与开发计划项目(202004a05020022)

出版年

2024
电子元件与材料
中国电子学会 中国电子元件行业协会 国营第715厂(成都宏明电子股份有限公司)

电子元件与材料

CSTPCD北大核心
影响因子:0.491
ISSN:1001-2028
参考文献量4
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