首页|AZO/Bi2O3复合薄膜的制备及压敏电阻特性研究

AZO/Bi2O3复合薄膜的制备及压敏电阻特性研究

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薄膜压敏电阻在微型电路和集成电路保护等方面有着重要的应用.采用磁控溅射方法制备了基于铝掺杂氧化锌(AZO)与氧化铋(Bi2O3)的复合薄膜,考察了AZO/Bi2O3/AZO构型下不同厚度Bi2O3和不同退火温度对样品电阻特性的影响.实验结果表明:退火后的复合薄膜具有明显的压敏电阻特性.随着Bi2O3层沉积时间的增加,复合薄膜的压敏电阻非线性系数先增大后减小,而压敏电压却保持增大趋势.当Bi2O3层沉积时间为15 min,在空气中600 ℃退火1h后,样品压敏电阻非线性系数为28.4,压敏电压为7.1 V,漏电流为0.059 mA.当退火温度由500℃升高到700 ℃时,薄膜样品的压敏非线性系数达到了38.4,对应漏电流则降低至0.044 mA,而压敏电压则增加到了10.4 V.该工作为开发新型薄膜压敏电阻材料提供了实验参考.
Preparation and varistor behaviors of AZO/Bi2O3 composite film
Film varistors are important in the applications of the microcircuits and integrated circuit protection.Here,the composite films based on aluminum doped zinc oxide(AZO)and bismuth oxide(Bi2O3)were prepared with magnetron sputtering method.The effects of Bi2O3 depositing time and annealing temperature on the varistor characteristics of the samples were investigated with the AZO/Bi2O3/AZO configuration.The experimental results indicate that AZO/Bi2O3 composite films possess obvious varistor characteristics.As the depositing time of the Bi2O3 layer increasing,the varistor nonlinear coefficient of the composite film first increases and then decreases while the varistor voltage maintains an increasing trend.When the depositing time of Bi2O3 layer is 15 min,the varistor nonlinear coefficient of the composite film annealed at 600 ℃ in air for 1 h is 28.4,the corresponding varistor voltage is 7.1 V and the leakage current is 0.059 mA.With the annealing temperature increasing from 500 ℃ to 700 ℃,the varistor nonlinear coefficient of the composite film sample can reach 38.4 and the corresponding leakage current decreases to 0.044 mA while the varistor voltage increases to 10.4 V.This work provides an experimental reference for the pursuit of new film varistor materials.

AZO thin filmvaristor characteristicsbismuth oxidemagnetron sputtering

余奇岭、易巧钧、薛腊梅、张锋

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重庆理工大学理学院,重庆 400054

重庆联合微电子中心有限责任公司,重庆 400030

AZO薄膜 压敏电阻特性 氧化铋 磁控溅射

2024

电子元件与材料
中国电子学会 中国电子元件行业协会 国营第715厂(成都宏明电子股份有限公司)

电子元件与材料

CSTPCD北大核心
影响因子:0.491
ISSN:1001-2028
年,卷(期):2024.43(11)