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形成液温度对高比容钽粉研制的钽电容器电性能的影响

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片式固体电解质钽电容器的小型化、大容量发展趋势促进了高比容钽粉应用于低压大容量钽电容器.Ta2O5介质氧化膜是钽电容器的"心脏",其生长质量决定了电容器的稳定性和可靠性.形成液温度是阳极氧化过程中的关键工艺参数之一,对Ta2O5介质氧化膜的质量有重要影响.以高比容钽粉制备的CAK45A-B-10 V/100 μF片式固体电解质钽电容器为研究对象,通过漏电流测试、Ⅰ-Ⅴ特性、高温稳定性及85℃-2000 h寿命试验,研究了在磷酸体系溶液中,形成液温度对高比容钽粉研制的钽电容器电性能的影响.研究结果表明:形成液温度从65 ℃提升至85 ℃,形成后漏电流均值降低约39%;高温容量稳定性及漏电流稳定性增强;钽电容器寿命试验后的漏电流变化率由-17%降低至-60%.
Effect of forming temperature on electrical properties of tantalum capacitors prepared with high-specific-volume tantalum powder
The miniaturization of volume and increasing capacitance of chipsolid electrolytic tantalum capacitors have promoted the application of high-specific-volume tantalum powder in tantalum capacitors with low-voltage and large-capacity.Ta2O5 dielectric film is regards as the"heart"of the tantalum capacitors,and the quality of the formation determines the stability and reliability of the capacitors.The forming temperature is one of the key parameters in the anodic oxidation process,which has a significant impact on the quality of Ta2O5 dielectric film.Using CAK45A-B-10 V/100 μF as the object,the effects of the forming temperature on Ta2O5 dielectric film were investigated,through DC leakage current(DCL),Ⅰ-Ⅴ characteristics,high-temperature stability,and 85 ℃-2000 h lifetime tests.The results showed that by increasing forming temperature from 65 ℃ to 85 ℃,the average leakage current was reduced by about 39%.The stability of high-temperature capacity and leakage current was enhanced.The lifetime test illustrated the decrease of DCL change rate from-17%to-60%.

forming temperaturehigh-specific-volume tantalum powdertantalum capacitorselectrical properties

邓俊涛、王凤华、胡鹏、郑传江、田超

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中国振华(集团)新云电子元器件有限责任公司,贵州贵阳 550018

形成液温度 高比容钽粉 钽电容器 电性能

2024

电子元件与材料
中国电子学会 中国电子元件行业协会 国营第715厂(成都宏明电子股份有限公司)

电子元件与材料

CSTPCD北大核心
影响因子:0.491
ISSN:1001-2028
年,卷(期):2024.43(11)