首页|多酸辅助一步合成双金属掺杂的多孔g-C3N4及染料和Cr(Ⅵ)去除研究

多酸辅助一步合成双金属掺杂的多孔g-C3N4及染料和Cr(Ⅵ)去除研究

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石墨相氮化碳(g-C3N4)由于其具有理想的微观结构和化学功能，在环境处理应用中的潜力引起了人们的广泛兴趣。本研究以多金属氧酸盐(NH4)4[Co(Ⅱ)Mo6O24H6](Co-Mo6)为前驱体，通过一种简单的一步热聚合法制备了 一系列Co和Mo共掺杂的多孔石墨相氮化碳(Co/Mo-CN)。CoMo6不仅起到氧化刻蚀作用制造多孔结构，还作为双金属掺杂源。与原始石墨相氮化碳(P-CN)相比，具有比表面积大，暴露活性位点丰富，光吸收能力强，带隙窄，光生载流子分离速率快及更负的导带电位等优点。这些优点使Co/Mo-CN对多种阳离子染料的吸附能力和可见光下光催化还原Cr(Ⅵ)能力显著提高，为优化具有良好性能的石墨相氮化碳基材料开辟了一条新的途径。
Polyoxometalate-assisted one-step synthesis of bimetal co-doped porous g-C3N4 for dyes and Cr(Ⅵ) removal
Graphitic carbon nitride(g-C3N4,denoted as CN)has gained significant attention for its poten-tial applications in treating environmental pollutants due to its unique microstructure and chemical proper-ties.In this study,porous CN co-doped with Co and Mo(Co/Mo-CN)was successfully synthesized using a convenient thermal polymerization method involving polyoxometalate precursor of(NH4)4[Co(Ⅱ)Mo6O24H6](CoMo6).The single-source precursor of CoMo6 was not only as a pore forming agent by oxi-dation etching,but also as a bimetallic doping source.Compared with pristine CN(P-CN),Co/Mo-CN possessed more advantages,such as high specific surface area,plentiful exposed active sites,extending the light absorption capability,rapid separation of photogenerated charge carriers,narrowed bandgap and more negative conduction band potential.As expected,the Co/Mo-CN exhibited a significant enhancement of adsorption ability for cationic dyes and photoreduction Cr(Ⅵ)under visible light irradiation compared to P-CN.This research opened a new pathway designing multifunctional CN-based materials.

graphitic carbon nitridepolyoxometalateporous nanostructureadsorptionphotocatalysis

毛蕊馨、王亚、刘刚、田苗苗、张雁南

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吉林工程技术师范学院化学与工业生物工程交叉学科研究院,吉林长春 130052

吉林工程技术师范学院生物与食品工程学院,吉林长春 130052

新型分子功能材料吉林省校企联合技术创新实验室,吉林长春 130052

石墨相氮化碳 多金属氧酸盐 多孔纳米结构 吸附 光催化

Science and Technology Development Project of Jilin ProvinceDoctoral Research Initiation Fund Project of Jilin Engineering

YDZJ202301ZYTS313BSKJ201918

2024

10.13563/j.cnki.jmolsci.2023.05.006

分子科学学报
中国化学会

分子科学学报

CSTPCD
影响因子：0.434
ISSN：1000-9035
年,卷(期)：2024.40(3)