光电技术应用2024,Vol.39Issue(2) :21-26.

基于4.0~4.8μm红外增透截止滤光片的研制

Preparation of Cut-off Filter of Infrared Penetration Based on 4.0~4.8μm

张翔 张薇
光电技术应用2024,Vol.39Issue(2) :21-26.

基于4.0~4.8μm红外增透截止滤光片的研制

Preparation of Cut-off Filter of Infrared Penetration Based on 4.0~4.8μm

张翔 1张薇1
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作者信息

  • 1. 陕西华星电子集团有限公司,陕西 咸阳
  • 折叠

摘要

详细阐明了干涉滤光片中截止滤光片膜系的设计理论、设计步骤和相关重要公式,并从实际应用出发,阐述了 4.0~4.8 μm红外增透截止滤光片的设计过程.通过现代膜系设计软件优化提升了膜层性能,最终制备出了达到设计指标要求的滤光片.外增透截止滤光片在截止带1.6~3.5 μm平均透过率≤3.5%,透射带4.0~4.8 μm平均透过率≥90%,滤光片膜层能耐受从-190 ℃~60℃温度冲击,显示了设计的准确性和制备工艺的可行性.

Abstract

The design theory,design steps and related important formula of the cut-off filter membrane of inter-ference filter are illustrated in detail,and from the practical application,the 4.0~4.8 μm infrared penetration cut-off filter design process is expounded.Through the modern membrane design software optimization,the membrane lay-er performance is improved,and the filter to meet the requirements of the design index is prepared.The mean trans-missivity of the infrared cut-off filter is less than 3.5%at 1.6~3.5 μm cut-off band,is more than 90%at 4.0~4.8 μm cut-off band,and the filter layer can withstand temperature shocks from-190 ℃ to 60 ℃,showing the accuracy of the design and the feasibility of the preparation process.

关键词

红外增透/干涉滤光片/截止滤光片/耐温度冲击/膜系设计与工艺

Key words

infrared penetration/interference filter/cut-off filter/temperature shock resistance/membrane de-sign and process

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出版年

2024
光电技术应用
东北电子技术研究所

光电技术应用

影响因子:0.406
ISSN:1673-1255
参考文献量8
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