首页|碳化硅MOSFET并联电流分配不均衡影响因素与抑制方法综述

碳化硅MOSFET并联电流分配不均衡影响因素与抑制方法综述

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碳化硅MOSFET凭借其高压、高温和高频等优异性能逐渐在工业中得到应用,然而碳化硅MOSFET并联电流分配不均衡问题限制了其性能发挥,并增加失效风险.为了充分发挥碳化硅MOSFET的性能优势,本文首先从芯片参数、功率回路参数和驱动回路参数 3 个方面阐述并联电流分配不均衡影响因素,然后综述了近年来国内外抑制并联不均衡电流的研究成果,对电流不均衡抑制方法从电流均衡种类、扩展难度、集成难度和经济成本四个维度进行了综合比较分析.最后,根据现有研究不足与面临挑战,本文对碳化硅MOSFET并联电流分配不均衡抑制方法进行展望.
Influencing Factors and Suppression Methods for Current Unbalance of Parallel Silicon Carbide MOSFETs:A Review
Silicon carbide MOSFETs have gradually been used in industry due to their excellent properties such as high voltage class,high temperature,and high frequency.However,the current unbalance of parallel SiC MOSFETs limits the performance of SiC MOSFETs and increases the risk of failure.In order to give full play to the performance advantages of SiC MOSFET,this paper expounds the influencing factors of current unbalance from three aspects,namely,chip parameters,power loop parameters,and drive loop parameters,and summarizes the research results of suppressing parallel current un-balance at home and abroad.The current unbalance suppression method is comprehensively compared and analyzed from four dimensions as follows:current balance types,expansion,integration,and cost.Finally,according to the existing defi-ciencies and challenges,this paper put forward the prospects in the current unbalance suppression method of SiC MOSFET.

silicon carbide MOSFETparallel currentunbalanced distributioninfluencing factorsuppression method

赵志斌、乔建申、孙鹏、蔡雨萌、赵斌、魏宏

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新能源电力系统国家重点实验室(华北电力大学),北京 102206

国网北京电科院,北京 100075

南瑞集团公司(国网电力科学研究院)有限公司,南京 211000

中电普瑞科技有限公司,北京 102200

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碳化硅MOSFET 并联电流 分配不均衡 影响因素 抑制方法

国家电网有限公司科技项目

52094021N012

2024

高电压技术
中国电力科学研究院 中国电机工程学会

高电压技术

CSTPCD北大核心
影响因子:2.32
ISSN:1003-6520
年,卷(期):2024.50(2)
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