首页|植酸/聚间苯二胺修饰纳米SiO2制备水性环氧复合涂层及其防腐性能

植酸/聚间苯二胺修饰纳米SiO2制备水性环氧复合涂层及其防腐性能

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以溶胶凝胶法制备了γ-缩水甘油醚氧丙基三甲氧基硅烷(KH560)改性SiO2(f-SiO2);将间苯二胺(mPD)原位聚合制备的聚间苯二胺(PmPD)共价接枝在f-SiO2表面,制得(PmPD-SiO2);最后,通过分子间作用力将植酸(PA)与PmPD-SiO2结合制得PA/PmPD-SiO2复合材料,用于制备水性环氧复合涂层.采用红外光谱、热失重分析和X射线光电子能谱表征了产物结构,通过扫描电镜、电化学和盐雾试验对涂层的防腐性能进行分析.结果表明,当添加质量分数为0.5%的PA/PmPD-SiO2时,涂层附着力0级、铅笔硬度3H、耐冲击45 kg·cm,缓蚀效率为97.2%,耐腐蚀性最佳;腐蚀电流密度较纯水性环氧树脂(WEP)涂层缩小了36倍,低频阻抗模量较纯WEP涂层提升了2个数量级.
Preparation of Phytic Acid/Polym-Phenylenediamine Modified Nano-SiO2 and Corrosion Resistance in Waterborne Epoxy Coatings
γ-Glycidoxypropyltrimethoxy silane(KH560)modified SiO2(f-SiO2)was prepared by sol-gel method.Polym-phenylenediamine(PmPD)prepared by in-situ polymerization of m-phenylenediamine(mPD)was covalently grafted on the surface of f-SiO2 to obtain PmPD-SiO2;finally,the combination of phytic acid(PA)and PmPD-SiO2 by intermolecular force to obtain the PA/PmPD-SiO2 composite was applied for the preparation of waterborne epoxy coatings.The structure of the products was characterized by Fourier-transformed infrared spectrum,thermal gravimetric analyzer and X-ray photoelectron spectroscopy.The anti-corrosion performance of the coatings was analyzed by scanning electron microscopy,water contact angle,electrochemical and salt spray experiment.The results show that when the mass fraction of 0.5%PA/PmPD-SiO2 is added,the coating adhesion is grade 0,the pencil hardness is 3H,the impact resistance is 45 kg·cm,the corrosion inhibition efficiency is 97.2%,and the corrosion resistance is the best.The corrosion current density is reduced by 36 times compared with the pure waterborne epoxy(WEP)coating,and the low-frequency impedance modulus is increased by 2 orders of magnitude.

nano SiO2phytic acidpolym-phenylenediaminewaterborne epoxymetal corrosion

黄小庆、杨建军、吴庆云、吴明元、张建安、刘久逸

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安徽大学化学化工学院安徽省水基高分子材料高性能化工程实验室,安徽 合肥 230601

纳米SiO2 植酸 聚间苯二胺 水性环氧树脂 金属腐蚀

国家自然科学基金资助项目安徽省科技计划重点项目

519730011704a0902018

2024

高分子材料科学与工程
中国石油化工股份有限公司科技开发部 国家自然科学基金委员会化学科学部 高分子材料工程国家重点实验室 四川大学高分子研究所

高分子材料科学与工程

CSTPCD北大核心
影响因子:0.563
ISSN:1000-7555
年,卷(期):2024.40(1)
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