Preparation and Film-Forming Properties of Poly(p-hydroxystyrene)Derivatives and Their Copolymers
The film-forming resin of poly(p-hydroxystyrene)was widely used in lithography technology due to its superior anti-etching ability and good deep ultraviolet transmittance.However,low glass transition temperature and film-forming properties of its derivative poly(p-tert-butoxyacyloxystyrene)(PHSt)limit its application in photoresist.In order to solve this problem,this work introduced the rigid structure 3-hydroxy-1-adamantane methacrylate(HADMA)into PHSt to explore its influences on the Tg and film-forming properties of the photoresist.The synthesis of the copolymer was proved by FT-IR,1H-NMR and GPC.The thermal properties were further characterized by TGA and DSC.The effects of HADMA on the performance of the materials were discussed by rheometer,step profiler,SEM and AFM.It shows that with the increase of HADMA content,the Tg of the polymer increases from 111.7 ℃ to 132.4 ℃,the quality of the polymer films is obviously improved,including the number of cracking and hole defects is reduced and the surface roughness is reduced.It is proved that introducing the rigid structure HADMA into PHSt can effectively improve Tg and film-forming properties.
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