Synthesis of Cinnamoyl-containing Self-enhancing Photosensitive Polyimides and Exploration of Lithographic Processes
A soluble polyimide(PI)was synthesized in a high-temperature one-step process using fluorinated dianhydride 4,4'-(hexafluoroisopropylidene)bis(phthalic anhydride)(6FDA)and reactive carboxyl-containing diamine 3,5-diaminobenzoic acid(DABA)as monomers,with the self-enhancing photosensitive cinnamoyl group grafted on the carboxyl group of the PI through the esterification reaction.Three kinds of photosensitive polyimide resins with different molecular weights,PI95,PI97.5 and PI 100,were synthesized by controlling the molar ratio of 6FDA to DABA.The photolithographic process parameters of the three kinds of photosensitive polyimides with different molecular weights were systematically explored,and the PI97.5 sample was preferred according to the quality of the photolithographic pattern.The sensitivity of the PI97.5 sample is 785 mJ/cm2,the resolution is up to 7 μm,and the line width is up to 14 μm.The 5％weight loss temperature of the cured film is higher than 340 ℃,and the glass transition temperature is up to 274.2 ℃,which shows good mechanical properties.The results provide a research basis for the development of new negative photosensitive polyimide photoresists.
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