Microstructure and Properties of HfMoNbZrNx Films Prepared by Radio Frequency Magnetron Sputtering
High-entropy alloy and nitride films HfMoNbZrNx are respectively deposited on the surfaces of single-sided polished Si(001),Al203(0001)and cemented carbide(WC-8 wt.％Co)substrates by radio frequency magnetron sputte-ring method to explore the effect of different RN on the microstructure and properties of HfMoNbZrNx films.Results show that the HfMoNbZr multiple alloy film incline to form an amorphous state and that with increasing RN,the HfMoNbZrN high entropy alloy nitride films transform into a face centered cubic(FCC)structure and the deposition rate decreases.The film hardness and elastic modulus reach maximum values of 21.8GPa±0.88GPa and 293.5GPa±9.56GPa respectively when RN=10％.Wear tests show that all films exhibited abrasive wear,compared to the multi-alloy film,the nitride films show an order of magnitude reduction in wear rate and a significant increase in film wear resistance.
radio frequency magnetron sputteringHfMoNbZrNx filmsmicrostructurehardnesstribology
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