Effect of Cr Ion Etching with Different Bias Voltages on TiAlN Coated Cemented Carbide
Based on the cathodic arc deposition technique,Cr ions are used to etch cemented carbide at different bias voltages and deposit TiAlN coatings on it.The effect of Cr ion etching on coated cemented carbide at different bias voltages is investigated.After etching,the surface roughness of the cemented carbide substrate increases significantly,and more Cr elements can be detected on the surface of the substrate.Cr ion etching cleaned the substrate surface and produced a more uneven topography,resulting in enhanced mechanical interlocking between the coating and the substrate,which in turn im-proves the adhesion.The HR-TEM image of interface reveals that the coating grows epitaxially on the Cr ion etched treated substrate,which is beneficial to improve the adhesive strength.In addition,when the etching bias is-200V,the Cr layer deposited on the substrate surface also reduces the residual stress between the coating and the substrate,which can increase the adhesive strength of the coating to the substrate from 61N to 77N.The wear resistance of coated carbide tends to in-crease as the etching bias increases,and the wear mechanism is abrasive wear and adhesive wear.
ion etchingTiAlNcemented carbidecathodic arc deposition
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