首页|Continuous-wave operation of 1550 nm low-threshold triple-lattice photonic-crystal surface-emitting lasers

Continuous-wave operation of 1550 nm low-threshold triple-lattice photonic-crystal surface-emitting lasers

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Benefitting from narrow beam divergence,photonic crystal surface-emitting lasers are expected to play an essential role in the ever-growing fields of optical communication and light detection and ranging.Lasers operating with 1.55 μm wavelengths have attracted particular attention due to their minimum fiber loss and high eye-safe threshold.However,high interband absorption significantly decreases their performance at this 1.55 μm wavelength.Therefore,stronger optical feedback is needed to reduce their threshold and thus improve the output power.Toward this goal,photonic-crystal resonators with deep holes and high dielectric contrast are often used.Nevertheless,the relevant techniques for high-contrast photonic crystals inevitably complicate fabrication and reduce the final yield.In this paper,we demonstrate the first continuous-wave operation of 1.55 μm photonic-crystal surface-emitting lasers by using a'triple-lattice photonic-crystal resonator',which superimposes three lattice point groups to increase the strength of in-plane optical feedback.Using this geometry,the in-plane 180° coupling can be enhanced threefold compared to the normal single-lattice structure.Detailed theoretical and experimental investigations demonstrate the much lower threshold current density of this structure compared to'single-lattice'and'double-lattice'photonic-crystal resonators,verifying our design principles.Our findings provide a new strategy for photonic crystal laser miniaturization,which is crucial for realizing their use in future high-speed applications.

Ziye Wang、Xia Liu、Pinyao Wang、Huanyu Lu、Bo Meng、Wei Zhang、Lijie Wang、Yanjing Wang、Cunzhu Tong

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State Key Laboratory of Luminescence and Applications,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China

Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China

Central Research Institute Planning Dept,2012 Labs,Huawei Technologies Company Ltd.,Shenzhen 518129,China

国家重点研发计划国家杰出青年科学基金王宽诚教育基金国家自然科学基金Scientific and Technological Development Program of Jilin,ChinaHuawei Technologies Company Ltd.,China

2023YFB36108006202550662105329SKL202302028

2024

光:科学与应用(英文版)
中国科学院长春光学精密机械与物理研究所

光:科学与应用(英文版)

CSTPCD
ISSN:2095-5545
年,卷(期):2024.13(3)
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