首页|Strong-field photoelectron holography in the subcycle limit

Strong-field photoelectron holography in the subcycle limit

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  • 国家科技期刊平台
  • NETL
  • NSTL
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Strong-field photoelectron holography is promising for the study of electron dynamics and structure in atoms and molecules,with superior spatiotemporal resolution compared to conventional electron and X-ray diffractometry.However,the application of strong-field photoelectron holography has been hindered by inter-cycle interference from multicycle fields.Here,we address this challenge by employing a near-single-cycle field to suppress the inter-cycle interference.We observed and separated two distinct holographic patterns for the first time.Our measurements allow us not only to identify the Gouy phase effect on electron wavepackets and holographic patterns but also to correctly extract the internuclear separation of the target molecule from the holographic pattern.Our work leads to a leap jump from theory to application in the field of strong-field photoelectron holography-based ultrafast imaging of molecular structures.

Tsendsuren Khurelbaatar、Jaewuk Heo、ShaoGang Yu、XuanYang Lai、XiaoJun Liu、Dong Eon Kim

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Center for Attosecond Science and Technology,Department of Physics,Pohang University of Science and Technology,Pohang,Gyeongbuk 37673,Korea

Max Planck POSTECH/KOREA Research Initiative,Pohang,Gyeongbuk 37673,Korea

State Key Laboratory of Magnetic Resonance and Atomic and Molecular Physics,Wuhan Institute of Physics and Mathematics,Innovation Academy for Precision Measurement Science and Technology,Chinese Academy of Sciences,430071 Wuhan,China

Wuhan Institute of Quantum Technology,430206 Wuhan,China

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National Research Foundation of Korea(NRF)Grants funded by the Ministry of Science,ICTNational Research Foundation of Korea(NRF)Grants funded by the Ministry of Science,ICTNational Research Foundation of Korea(NRF)Grants funded by the Ministry of Science,ICTKorea Institute for Advancement of Technology(KIAT)grant funded by the Korea Government(MOTIE)(HRD Program for Industrial InnovaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaNational Natural Science Foundation of ChinaCAS Project for Young Scientists in Basic Research

2022M3H4A1A040741532020R1A2C2103181RS-2022-00154676P0008763121210041227442011922413YSBR-055

2024

10.1038/s41377-024-01457-7

光:科学与应用(英文版)
中国科学院长春光学精密机械与物理研究所

光:科学与应用(英文版)

CSTPCD
ISSN：2095-5545
年,卷(期)：2024.13(6)