首页|Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation
Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation
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Ptychographic extreme ultraviolet(EUV)diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry,as it can image wafer samples in reflection geometry at the nanoscale.This technique has surged attention recently,owing to the significant progress in high-harmonic generation(HHG)EUV sources and advancements in both hardware and software for computation.In this study,a novel algorithm is introduced and tested,which enables wavelength-multiplexed reconstruction that enhances the measurement throughput and introduces data diversity,allowing the accurate characterisation of sample structures.To tackle the inherent instabilities of the HHG source,a modal approach was adopted,which represents the cross-density function of the illumination by a series of mutually incoherent and independent spatial modes.The proposed algorithm was implemented on a mainstream machine learning platform,which leverages automatic differentiation to manage the drastic growth in model complexity and expedites the computation using GPU acceleration.By optimising over 200 million parameters,we demonstrate the algorithm's capacity to accommodate experimental uncertainties and achieve a resolution approaching the diffraction limit in reflection geometry.The reconstruction of wafer samples with 20-nm high patterned gold structures on a silicon substrate highlights our ability to handle complex physical interrelations involving a multitude of parameters.These results establish ptychography as an efficient and accurate metrology tool.
Imaging Physics Department,Applied Science Faculty,Delft University of Technology,Lorentzweg 1,Delft 2628 CJ,The Netherlands
Nanophotonics,Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena,Utrecht University,P.O.Box 80000,Utrecht 3508 TA,The Netherlands
Research Department,ASML Netherlands B.V,De Run 6501,Veldhoven 5504 DR,The Netherlands
Perspectief research programme financed by the Dutch Research Council(NWO)
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