首页|锡掺杂对氧化锌纳米柱阵列结构与光电性能的影响

锡掺杂对氧化锌纳米柱阵列结构与光电性能的影响

扫码查看
选择不同的Sn浓度,以溶胶凝胶法在N型重掺杂基板上制备了系列Zn1-xSnxO(x=0.01-0.07)纳米柱样品,并在不同温度下(500 ℃、600℃、700℃)进行了退火热处理.利用光/暗电流测试对样品的光电性能进行了表征,发现当偏压为5V时,在600 ℃退火1小时后,x=0.04的样品表现出最佳的光/暗电流变化比(600%).XRD与FE-SEM结果显示该纳米柱样品具有最大的长度以及较好的结晶度,意味着样品具有较高的结晶质量;PL测试发现x=0.04时样品缺陷浓度最小,这说明在该缺陷浓度下锡对锌进行替代时产生了更多的载流子,从而导致了最优的光电性能.
Investigation of tin-doping effect on the microstructure and photo detection of zinc oxide nanorod arrays
A series of Zn1-xSnxO(x=0.01-0.07)nanopillar samples were prepared on N-type heavily doped substrates by the sol gel method with different concentrations of Sn,and annealed at different tem-peratures(500 ℃,600 ℃,700 ℃).The photoelectric performance of the sample was characterized using light/dark current testing,and it was found that when the bias voltage was 5V,the sample with x=0.04 exhibited the best light/dark current change ratio(600%)after annealing at 600 ℃ for 1 hour.The XRD and FE-SEM results show that the nanopillar sample has the maximum length and good crystallinity,indicating that the sample has a higher crystalline quality.PL testing found that the defect concentration of the sample was the smallest at x=0.04,indicating that at this defect concentration,tin replaced zinc and produced more charge carriers,resulting in optimal optoelectronic performance.

tin-doping ZnOPhotoelectric propertiessol-gel method

汤小兰、吴振英

展开 >

苏州工业职业技术学院电子与通信工程系,江苏苏州 215104

锡掺杂氧化锌 光电性能 溶胶凝胶法

2024

功能材料与器件学报
中科院上海微系统与信息技术研究所 中国材料研究学会

功能材料与器件学报

影响因子:0.3
ISSN:1007-4252
年,卷(期):2024.30(2)